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On this page, you can select 「MainGroup」 or 「Facet」 in G03F. |
HB:Handbook | ||||
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Select the desired 「MainGroup」 or 「facet」 etc. |
CC:Concordance | ||||
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Originals forphotomechanical production of textured or patterned surfaces, e.g. masks,photo-masks orreticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof [3,2012.01] | HB | CC | 2H195 | |
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Colour separation; Correction of tonal value (photographic copying apparatus in general G03B) | HB | CC | 2H117 | |
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Screening processes; Screens therefor | HB | CC | 2H117 | |
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Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H01L, e.g. H01L 21/00, H05K) [3,5] | HB | CC | 2H196 | |
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Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (G03F 7/22 takes precedence; preparation of photographic masks G03F 1/00; within photographic printing apparatus for making copies G03B 27/00) [4] | HB | CC | 2H197 | |