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This page displays all 「FI」 in main group H01J37/00. |
HB:Handbook | ||||
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CC:Concordance | |||||
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Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof () [2,5] | HB | CC | 5C101 | |
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.Details | HB | CC | 5C101 | |
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..Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement | HB | CC | 5C101 | |
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Detection and control of beam currents, beam diameters, and others | HB | CC | 5C101 | |
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Shaft alignment | HB | CC | 5C101 | |
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Others | HB | CC | 5C101 | |
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...Electron- or ion-optical arrangements for separating electrons or ions according to their energy (particle separator tubes H01J 49/00) [3] | HB | CC | 5C101 | |
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...Electron sources; Electron guns | HB | CC | 5C101 | |
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for electron microscopes | HB | CC | 5C101 | |
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for electron beam processing [melting, fragmentation, punching, and welding] | HB | CC | 5C101 | |
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Others | HB | CC | 5C101 | |
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....Geometrical arrangement of electrodes for beam-forming [3] | HB | CC | 5C101 | |
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....Construction of guns or parts thereof (H01J 37/067-H01J 37/077 take precedence) [3] | HB | CC | 5C101 | |
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....Replacing parts of guns; Mutual adjustment of electrodes (H01J 37/073-H01J 37/077 take precedence; vacuum locks H01J 37/18) [3] | HB | CC | 5C101 | |
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....Eliminating deleterious effects due to thermal effects or electric or magnetic fields (H01J 37/073-H01J 37/077 take precedence) [3] | HB | CC | 5C101 | |
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....Electron guns using field emission, photo emission, or secondary emission electron sources [3] | HB | CC | 5C101 | |
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....Electron guns using thermionic emission from cathodes heated by particle bombardment or by irradiation, e.g. by laser [3] | HB | CC | 5C101 | |
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....Electron guns using discharge in gases or vapours as electron sources [3] | HB | CC | 5C101 | |
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...Ion sources; Ion guns | HB | CC | 5C101 | |
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...Diaphragms; Shields associated with electron- or ion-optical arrangements; Compensation of disturbing fields [3] | HB | CC | 5C101 | |
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Beam limiting devices | HB | CC | 5C101 | |
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Others | HB | CC | 5C101 | |
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...Lenses | HB | CC | 5C101 | |
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....electrostatic | HB | CC | 5C101 | |
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....magnetic | HB | CC | 5C101 | |
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.....Electromagnetic lenses [3] | HB | CC | 5C101 | |
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Magnetic poles [whole-pieces] | HB | CC | 5C101 | |
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Cooling and thermolysis | HB | CC | 5C101 | |
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Super-conductive lens | HB | CC | 5C101 | |
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Others | HB | CC | 5C101 | |
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.....Permanent magnetic lenses [3] | HB | CC | 5C101 | |
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....Combinations of electrostatic and magnetic lenses [3] | HB | CC | 5C101 | |
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...Arrangements for directing or deflecting the discharge along a desired path (lenses H01J 37/10) [2] | HB | CC | 5C101 | |
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for use with transmission electron microscopes | HB | CC | 5C101 | |
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for use with scanning electron microscopes | HB | CC | 5C101 | |
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for use with electron beam exposure devices | HB | CC | 5C101 | |
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for use with ion beam devices | HB | CC | 5C101 | |
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for use with electron beam processing, welding, and melting | HB | CC | 5C101 | |
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Others | HB | CC | 5C101 | |
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....External mechanical adjustment of electron- or ion-optical components (H01J 37/067, H01J 37/20 take precedence) [3] | HB | CC | 5C101 | |
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...Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators [2] | HB | CC | 5C101 | |
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for use with transmission electron microscopes | HB | CC | 5C101 | |
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for use with scanning electron microscopes | HB | CC | 5C101 | |
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Others | HB | CC | 5C101 | |
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..Vessels; Containers | HB | CC | 5C101 | |
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..Vacuum locks | HB | CC | 5C101 | |
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..Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support | HB | CC | 5C101 | |
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Devices for specimen support | HB | CC | 5C101 | |
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Devices for specimen exchange | HB | CC | 5C101 | |
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Devices to move specimens on transmission electron microscopes | HB | CC | 5C101 | |
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Devices to move specimens on scanning electron microscopes | HB | CC | 5C101 | |
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Devices for specimen heating and cooling | HB | CC | 5C101 | |
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Other devices for dealing with specimens (e.g. tension and magnetization] | HB | CC | 5C101 | |
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Devices to prevent specimen contamination | HB | CC | 5C101 | |
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Devices to prevent specimen electrification | HB | CC | 5C101 | |
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Others | HB | CC | 5C101 | |
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..Means for adjusting the focus [2] | HB | CC | 5C101 | |
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for transmission electron microscopes | HB | CC | 5C101 | |
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for scanning electron microscopes | HB | CC | 5C101 | |
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Others | HB | CC | 5C101 | |
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..Optical or photographic arrangements associated with the tube | HB | CC | 5C101 | |
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...Associated with transmission | HB | CC | 5C101 | |
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Image observation | HB | CC | 5C101 | |
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.Fluorescent screens | HB | CC | 5C101 | |
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.Image tubes | HB | CC | 5C101 | |
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Photography | HB | CC | 5C101 | |
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.Shutters | HB | CC | 5C101 | |
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.Film and photographic plates | HB | CC | 5C101 | |
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.Exposure control | HB | CC | 5C101 | |
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Magnification | HB | CC | 5C101 | |
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Data displays | HB | CC | 5C101 | |
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Others | HB | CC | 5C101 | |
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...Items for scanning electron microscopes | HB | CC | 5C101 | |
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Image displays | HB | CC | 5C101 | |
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.Scanning deflection | HB | CC | 5C101 | |
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.Screen division, enlargement, and rotation | HB | CC | 5C101 | |
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.Magnification displays and scale marks | HB | CC | 5C101 | |
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.Intensity | HB | CC | 5C101 | |
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.Contrast | HB | CC | 5C101 | |
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.Signal to noise ration | HB | CC | 5C101 | |
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.Other signal treatments | HB | CC | 5C101 | |
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Screen projection | HB | CC | 5C101 | |
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.Exposure control | HB | CC | 5C101 | |
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Optical observation | HB | CC | 5C101 | |
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Others | HB | CC | 5C101 | |
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..Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for | HB | CC | 5C101 | |
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..Detectors; Associated components or circuits therefor [3] | HB | CC | 5C101 | |
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..Components associated with high voltage supply [2006.01] | HB | CC | 5C101 | |
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for cathode heating | HB | CC | 5C101 | |
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for acceleration and bias | HB | CC | 5C101 | |
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for help with lens magnification | HB | CC | 5C101 | |
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Others | HB | CC | 5C101 | |
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.Tubes for spot-analysing by electron or ion beams; Microanalysers [3] | HB | CC | 5C101 | |
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X-radiation microanalyzers | HB | CC | 5C101 | |
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Ion microanalyzers | HB | CC | 5C101 | |
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Others | HB | CC | 5C101 | |
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..using scanning beams [3] | HB | CC | 5C101 | |
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.Electron or ion microscopes; Electron- or ion-diffraction tubes [2] | HB | CC | 5C101 | |
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..Shadow microscopy [3] | HB | CC | 5C101 | |
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..with scanning beams | HB | CC | 5C101 | |
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Strobe for scanning electron microscopes; electron beam testers | HB | CC | 5C101 | |
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SEM | HB | CC | 5C101 | |
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STEM | HB | CC | 5C101 | |
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Scanning tunneling microscopes and atomic force microscopes (G01N takes precedence) | HB | CC | 5C101 | |
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Others | HB | CC | 5C101 | |
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..Emission microscopes, e.g. field-emission microscopes [2] | HB | CC | 5C101 | |
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..Reflection microscopes [2] | HB | CC | 5C101 | |
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..Electron- or ion-diffraction tubes [2] | HB | CC | 5C101 | |
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.Electron-beam or ion-beam tubes for localised treatment of objects | HB | CC | 5C101 | |
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characterized by beam control | HB | CC | 5C101 | |
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Others | HB | CC | 5C101 | |
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..Arrangements enabling beams to pass between regions of different pressure [3] | HB | CC | 5C101 | |
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..Controlling tubes by external information, e.g. programme control (H01J 37/304 takes precedence) [3] | HB | CC | 5C101 | |
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..Controlling tubes by information coming from the objects, e.g. correction signals [3] | HB | CC | 5C101 | |
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..for casting, melting, evaporating, or etching [2] | HB | CC | 5C101 | |
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Devices with electron and ion beams for etching | HB | CC | 5C101 | |
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Devices with electron and ion beams for exposure | HB | CC | 5C101 | |
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Others | HB | CC | 5C101 | |
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..for cutting or drilling [2] | HB | CC | 5C101 | |
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..for welding [2] | HB | CC | 5C101 | |
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..for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation (H01J 37/36 takes precedence) [3] | HB | CC | 5C101 | |
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Scanning deflection | HB | CC | 5C101 | |
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Injection chamber; wafer retention and exchange | HB | CC | 5C101 | |
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Monitoring and control for injection rate, etc. | HB | CC | 5C101 | |
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Micro ion beams | HB | CC | 5C101 | |
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Ion beam devices for deposition | HB | CC | 5C101 | |
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Others | HB | CC | 5C101 | |
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.Gas-filled discharge tubes (heating by discharge H05B) | HB | CC | 5C101 | |
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..operating with cathodic sputtering (H01J 37/36 takes precedence) [3] | HB | CC | 5C101 | |
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..for cleaning surfaces while plating with ions of materials introduced into the discharge, e.g. introduced by evaporation [3] | HB | CC | 5C101 | |