| ReturnTo Theme-Group-Choice | Onelevelup |
| 5C030 | Electron sources, ion sources | |
| H01J27/00 -27/26 | ||
| H01J37/04@A;37/04@B | AA | AA00 CONTROLLING BEAMS |
AA01 | AA02 | AA03 | AA04 | AA06 | AA07 | AA08 | AA09 | AA10 | |
| . Detecting and controlling beam current | . . Sensors, meters | . . Stabilizing beam current | . Detecting and controlling beam shape | . Axis alignment | . . Detection systems | . . Control systems | . . Mechanical adjustment | . Others | ||||
| AB | AB00 APPLICATIONS |
AB01 | AB02 | AB03 | AB04 | AB05 | AB06 | |||||
| . Transmission electron microscopes | . Scanning electron microscopes | . Electron beam exposure, plotting devices | . Electron beam welding, machining devices | . Ion beam devices | . Other devices | |||||||
| H01J37/04@Z;37/06@A-37/07;37/248@A;37/248@B | BB | BB00 ELECTRON SOURCE STRUCTURE |
BB01 | BB02 | BB03 | BB04 | BB05 | BB06 | BB07 | BB09 | BB10 | |
| . Electrode parts | . . Cathodes, filaments | . . . Wire-like, rectangular | . . . Variants using LaB6 materials | . . Wehnelt electrodes | . . Anodes | . . Mutual adjustment, replacement | . Accelerating tubes (accelerating sections) | . Ventilating, removing contamination | ||||
| BB11 | BB12 | BB14 | BB15 | BB17 | ||||||||
| . Electromagnetic shielding | . Insulating members | . For electron beam welding processes | . For vapor deposition | . Others | ||||||||
| BC | BC00 CONTROLLING ELECTRON SOURCES |
BC01 | BC02 | BC03 | BC04 | BC06 | BC07 | BC09 | ||||
| . Power sources | . . Cathode heating | . . Wehnelt bias | . . Acceleration | . Controlling beams | . Protecting circuits | . Others | ||||||
| H01J37/073 | CC | CC00 FIELD EMISSION ELECTRON GUNS |
CC01 | CC02 | CC03 | CC04 | CC06 | CC07 | CC08 | CC10 | ||
| . Electrode structure | . . Cathodes | . . Leading electrodes, anodes | . . Mutual adjustment, replacement of electrodes | . Ventilating | . Controlling beams | . Flushing | . Others | |||||
| H01J37/08;27/00-27/26 | DD | DD00 TYPES OF PLASMA ION SOURCES |
DD01 | DD02 | DD03 | DD04 | DD05 | DD06 | DD07 | DD08 | DD10 | |
| . High frequency types | . Microwave types | . Penning ionization gauge (i.e., PIG) types | . Electron bombardment types | . Low voltage arc discharge types | . . Multipolar magnetic field types | . Duoplasmatrons | . Optical (i.e., laser) excitation types | . Others | ||||
| DE | DE00 DETAILS OF PLASMA ION SOURCES |
DE01 | DE02 | DE03 | DE04 | DE05 | DE06 | DE07 | DE08 | DE09 | DE10 | |
| . Discharge chambers | . . Filaments | . . Hollow cathodes | . Leading electrodes | . Gas introducing systems | . . Evaporation furnaces | . Magnets | . . Cusp magnetic fields | . Power sources, controllers | . Others | |||
| DF | DF00 SURFACE EFFECT ION SOURCES |
DF01 | DF02 | DF04 | DF05 | DF06 | DF07 | DF08 | DF10 | |||
| . Surface ionizing ion sources | . Field ionizing gas ion sources | . Liquid metal ion sources | . . Emitters | . . Reservoirs | . . Heating means | . . Power sources, controllers | . Others | |||||
| DG | DG00 SPECIAL IONS AND APPLICATIONS |
DG01 | DG02 | DG03 | DG05 | DG06 | DG07 | DG09 | ||||
| . Negative ions | . Polyvalent ions | . Cluster ions | . For ion microanalyzers | . For neutral particle injectors | . For ion beam etching | . Others |