F-Term-List

4G072 SILICON; COMPOUNDS THEREOF
C01B33/00 -33/193
C01B33/00-33/193 AA AA00
SUBJECT (OBLIGATORY CLASSIFICATION PLACE)
AA01 AA02 AA03 AA04 AA05 AA06 AA07 AA08 AA09 AA10
. Silicon . Doped silicon . Amorphous silicon (a-Si) . Amorphous hydrogenated silicon (a-Si:H) . Silicon hydrides . . Monosilane (SiH4) . . Disilane (Si2H6) . Silicon fluorides . . Silicon tetrafluoride (SiF4) . . Trifluorosilane (SiHF3)
AA11 AA12 AA13 AA14 AA15 AA16 AA17 AA18 AA19 AA20
. Silicon chlorides . . Silicon tetrachloride (SiCl4) . . Hexachlorodisilane (Si2Cl6) . . Trichlorosilane (SiHCl3) . Silicon bromides or silicon iodides . Silicon mixed-halides . Hydrosilicofluoric acids (H2SiF6) . Alkali metal silicofluorides . Silicofluorides not otherwise provided for . Silicides
AA21 AA22 AA24 AA25 AA26 AA27 AA28 AA29 AA30
. . of titanium (Ti) . . of chromium (Cr) molybdenum (Mo) or tungsten (W) . Silicon monoxide (SiO) . Silicon dioxide or silica (SiO2) . . anhydrous . . hydrous . Colloidal silica (Additional classification is made in CC) . Crystalline silica . . Quartz
AA31 AA32 AA33 AA34 AA35 AA36 AA37 AA38
. . Quartz crystal . . Cristobalite . Crystalline silica with zeolite structures . Quartz glass . Silica containing other oxides . . Aluminium oxides (Al2O3) . . Titanium oxides (TiO2) . Silicas containing other substances
AA41 AA44 AA45 AA50
. Coated silicas . Silica stones or sands . Diatomaceous earth . Others
BB BB00
SHAPE OR STRUCTURE
BB01 BB02 BB03 BB04 BB05 BB06 BB07 BB08 BB09 BB10
. Lumps . Plates . Bars . Fibres . Granules or powders . Extended granules . Spheres . Tablet-types . Thin films . Multilayer films
BB11 BB12 BB13 BB14 BB15 BB16 BB20
. Single crystals . Polycrystals . Amorphous . Glass . Porous . Hollow . Others
CC CC00
COLLOIDS
CC01 CC02 CC04 CC05 CC07 CC08 CC10
. Hydrosols . Organosols . Hydrogels . Organogels . Xerogels . Aerogels . Silica gels
CC11 CC13 CC14 CC16 CC18 CC20
. Ultrafine silica gels . Colloidal silicas or white carbons . Precipitated silicas . Fumed or misty silicas; High-temperature silicas . Fused silicas . Others
DD DD00
DIAMETER OF GRAIN
DD01 DD02 DD03 DD04 DD05 DD06 DD07 DD08 DD09
. 1 millimetre or more . 1 to 0.1 millimetre . 0.1 to 0.01 millimetre . 0.01 to 0.001 millimetre or 10 to 1 micrometre . 1 to 0.1 micrometre . 0.1 to 0.01 micrometre . 0.01 to 0.001 micrometre . 1 to 0.1 millimicron or nanometre . 0.1 millimicron or 1A or less
EE EE00
DISPERSION MEDIUM
EE01 EE02 EE03 EE05 EE06 EE07 EE10
. Water . Acids . Alkalis . Ethanol . Other alcohols . Other organic solvents . Others
FF FF00
BASE MATERIAL FOR THIN FILM
FF01 FF02 FF04 FF06 FF07 FF09 FF10
. Glass . Ceramics . Metals . Other inorganic materials . Organic materials . Semiconductors . Others
GG GG00
CATEGORY OF INVENTION
GG01 GG02 GG03 GG04 GG05
. Single substances . Composition . Methods . Apparatus . Drawings of apparatus
HH HH00
SILICON-BASED REACTANT, RAW MATERIAL, OR TREATING AGENT
HH01 HH02 HH03 HH04 HH05 HH06 HH07 HH08 HH09 HH10
. Silicon . Metal silicides or silicon alloys . Silicon hydrides . . Silanes (SiH4) . Silicon fluorides . . Silicon tetrafluorides (SiF4) . Silicon chlorides . . Silicon tetrachlorides (SiCl4) . . Trichlorosilanes (SiHCl3) . Silicon bromides or silicon iodides
HH11 HH13 HH14 HH15 HH16 HH17 HH18 HH19 HH20
. Silicon mixed-halides . Silicon monoxides . Silicon dioxides not covered by HH17-HH20 . . crystalline . . amorphous . Colloidal silica . . Sols . . Gels . Silica stones or sands
HH21 HH22 HH23 HH24 HH25 HH26 HH28 HH29 HH30
. Sodium silicates or water glass . Other alkali metal silicates . Alkaline earth metal silicates . Other silicates . Hydrosilicofluoric acids . Silicofluorides . Organic silicon compounds . . Alkylsilicons . . Alkoxysilanes
HH33 HH36 HH37 HH38 HH39 HH40
. Other silicon compounds . Minerals . Clays . Slags . Plants . Waste materials
HH41 HH43 HH50
. . from wet phosphoric acids . Ground water . Others
JJ JJ00
NON SILICON-BASED REACTANT, RAW MATERIAL, OR TREATING AGENT
JJ01 JJ02 JJ03 JJ04 JJ05 JJ06 JJ07 JJ08 JJ09
. Hydrogen . Carbon . Oxygen . Halogens . . Fluorine . . Chlorine . Other non-metallic elements . Alkali metallic elements . Other metallic elements
JJ11 JJ12 JJ13 JJ14 JJ15 JJ16 JJ17 JJ18
. Water . Carbon dioxide . Acids . . Hydrogen chlorides (HCl) . . Sulfuric acids (H2SO4) . . Nitric acids (HNSO3) . . Phosphoric acids (H3PO4) . . Hydrogen fluorides (HF)
JJ21 JJ22 JJ23 JJ25 JJ26 JJ28 JJ30
. Alkalis . . Sodium hydroxides (NaOH) . . Ammonia (NH3) . Hydrides . Oxides . Metal halides . Other metal salts
JJ33 JJ34 JJ38 JJ39
. Ammonium compounds . Other inorganic compounds . Alcohols . . Ethanol
JJ41 JJ42 JJ44 JJ45 JJ46 JJ47 JJ50
. Organic acids . Organic nitrogen-containing compounds . Alkylmetals . Other organo-metallic compounds . Metal alkoxides . Other organic compounds . Others
KK KK00
ADDITIVE OR CATALYST
KK01 KK03 KK05 KK06 KK07 KK09
. Acids . Alkalis . Silicates . Sulfates . Other metallic salts . Other inorganic compounds
KK11 KK13 KK15 KK17 KK20
. Metallic elements . Alcohols . Organic nitrogen-containing compounds . Other organic compounds . Others
LL LL00
REACTION OR TREATMENT MEDIUM
LL01 LL02 LL03 LL04 LL05 LL06 LL07 LL09
. Hydrogen . Nitrogen . Inert gases . Carbon dioxide . Other gases . Water . Acids . Alkalis
LL11 LL13 LL14 LL15 LL17 LL19
. Alcohols . Ethers . Organic solvents containing nitrogen . Other organic solvents . Other liquids . Solids
MM MM00
OPERATION RELATING TO REACTION OR SEPARATION
MM01 MM02 MM03 MM04 MM06 MM08 MM09
. Formation reaction . Mixing or shearing . Separating or recovering . Extracting solvents . Concentration . Purification . Distillation
MM11 MM12 MM13 MM14 MM17
. Adsorption . . Active carbons . . Zeolite . Ion exchange . Forming complexes
MM21 MM22 MM23 MM24 MM25 MM26 MM28
. Deposition or precipitation . Filtration . Cleaning . . Acids . . Alkalis . Crushing . Classifying or sieving
MM31 MM32 MM33 MM34 MM35 MM36 MM37 MM38 MM40
. Drying . Spray-drying . Vacuum-drying . Freeze-drying . Dehydrating . Baking . Sintering . Melting . Others
NN NN00
OPERATION RELATING TO CRYSTAL OR THIN FILM
NN01 NN02 NN03 NN05 NN06 NN09 NN10
. Polycrystallisation . Casting methods . Single-crystal growth . Zone melting . Amorphising . Vacuum deposition . Molecular-beam epitaxy (MBE)
NN11 NN13 NN14 NN15 NN16 NN17 NN18
. Spattering . Chemical vapour deposition (CVD) methods . Siemens methods . . Single carrier . . Multiple carriers . . Gate carriers . Plasma chemical vapour deposition (PCVD) methods
NN21 NN24 NN25 NN27 NN30
. Forming thin films from solutions . Epitaxial growth excluding molecular beam epitaxy (MBE) . Doping . Etching . Others
PP PP00
OPERATION RELATING TO COLLOIDS
PP01 PP02 PP03 PP05 PP06 PP07 PP09
. Forming sols . Growing sols . Gelling sols . Forming sols . Aging gels . Dispersing gels or converting gels to sols . Forming heels
PP11 PP12 PP13 PP14 PP15 PP17 PP20
. Ultrafiltration . Dialysis . Electrolytic dialysis . Replacing organic solvents . Evaporating organic solvents . Sol-gel methods . Others
QQ QQ00
SECONDARY OR OTHER OPERATION
QQ01 QQ02 QQ03 QQ05 QQ06 QQ07 QQ09
. Granulating . Forming . Compressing . Stabilising . Treating or modifying surfaces excluding hydrophobisation . Hydrophobisation . Coating
QQ13 QQ16 QQ20
. Treating waste materials . Controlling . Others
RR RR00
REACTION OR TREATMENT PROCESS; HEATING PROCESS; REACTION OR TREATMENT APPARATUS
RR01 RR02 RR03 RR04 RR05 RR06 RR07
. Decomposition reactions . Disproportionation reactions . Oxidation . Reduction . Hydrolysis . Neutralisation . Other reactions
RR11 RR12 RR13 RR15 RR16 RR17 RR19 RR20
. Gas-phase methods . Liquid-phase methods . Solid-phase methods . Multi-stage methods . Recirculation methods . Fluidisation methods . Hydrothermal treatments . Autoclave treatments
RR21 RR22 RR23 RR24 RR25 RR26 RR28 RR30
. Electric furnaces . Arc furnaces . High-frequencies . Microwaves . Plasma . Lasers . Electrodes . Others
SS SS00
METHOD FOR REACTING SILICATE AND ACID
SS01 SS02 SS04 SS05 SS06 SS07 SS09 SS10
. Adding acids . Adding silicates . Batch methods or one-time methods . Batch methods or discontinuous methods . Continuously-adding methods . Simultaneously-adding methods . Strongly acidic conditions; pH 1 or less . Acidic conditions; pH 2 to 5
SS11 SS12 SS14 SS20
. Neutral conditions; pH 6 to 8 . Alkaline conditions; pH 9 or more . Adding third substances (Additional classification is made in KK.) . Others
TT TT00
CLAIMED PROPERTY
TT01 TT02 TT04 TT05 TT06 TT08 TT09
. Grain diameters . Distributions of grain diameters . Bulk densities or apparent specific gravities (g/ml) . Specific surface areas (m2/g) . BET specific surface areas . Average pore diameters . Pore volumes (ml/g)
TT11 TT12 TT14 TT15 TT17 TT19 TT20
. Oil-absorption (ml/100g) . Values of dibutyl phthalate (DBP) . Japanese Industrial Standards (JIS) . Deutsches Institut fur Normung (DIN) or German Industrial Standards . Conductivity . Impurity amounts . . Alkali metals
TT21 TT30
. . Uranium (U) or thorium (Th) . Others
UU UU00
FIELD OR USE
UU01 UU02 UU03 UU04 UU07 UU08 UU09
. Semiconductors . Solar batteries . Optical conductive materials . Photosensitive materials . Fillers . . Rubbers . . Plastics
UU11 UU12 UU13 UU15 UU17 UU19
. Adsorbents . Drying agents . Chromatography . Catalysts . Carriers . Olefin polymerisation
UU21 UU22 UU23 UU25 UU26 UU27 UU30
. Raw materials of glass . Teeth brushing . Dentistry . Paper manufacturing . Fibres . Foods . Others
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