FI (list display)

  • C03B8/00
  • Production of glass by other processes than melting processes (C03B 37/014 takes precedence; preparation of finely divided silica, in general C01B 33/18) [4] HB CC 4G014
  • C03B8/00@A
  • Characterized by antecedents processes HB CC 4G014
  • C03B8/00@B
  • Characterized by sintering or heat treatment processes HB CC 4G014
  • C03B8/00@C
  • Production of non-oxide glasses HB CC 4G014
  • C03B8/00@Z
  • Others HB CC 4G014
  • C03B8/02
  • .by liquid phase reaction processes [4] HB CC 4G014
  • C03B8/02@A
  • Characterized by raw materials (main raw material, dopant raw materials) HB CC 4G014
  • C03B8/02@B
  • .Using of additives (catalysts, surfactants) HB CC 4G014
  • C03B8/02@C
  • involving crushing process HB CC 4G014
  • C03B8/02@D
  • Adding silica powder or minute particles HB CC 4G014
  • C03B8/02@E
  • Characterized by agitation or vibration process HB CC 4G014
  • C03B8/02@F
  • Mixing plurality of sol solutions HB CC 4G014
  • C03B8/02@G
  • Characterized by pH adjustments HB CC 4G014
  • C03B8/02@H
  • Characterized by separation processes (filtration, classification) HB CC 4G014
  • C03B8/02@J
  • Characterized by drying processes HB CC 4G014
  • C03B8/02@K
  • Characterized by treatment of gels (atmospheric heating) HB CC 4G014
  • C03B8/02@L
  • .Characterized by cleaning processes HB CC 4G014
  • C03B8/02@M
  • Characterized by temperature control HB CC 4G014
  • C03B8/02@N
  • Characterized by structures or physical properties of antecedents or products (bubbles, cords, impurities, light absorption) HB CC 4G014
  • C03B8/02@Z
  • Others HB CC 4G014
  • C03B8/04
  • .by gas phase reaction processes [4] HB CC 4G014
  • C03B8/04@A
  • VAD processes HB CC 4G014
  • C03B8/04@B
  • Internal deposition CVD HB CC 4G014
  • C03B8/04@C
  • External deposition CVD HB CC 4G014
  • C03B8/04@D
  • Characterized by raw materials HB CC 4G014
  • C03B8/04@E
  • Introducing dopants into gaseous raw materials HB CC 4G014
  • C03B8/04@F
  • Characterized by burners HB CC 4G014
  • C03B8/04@G
  • .Profiles or structures of ports HB CC 4G014
  • C03B8/04@H
  • .Burner layout HB CC 4G014
  • C03B8/04@J
  • .Driving process of burners HB CC 4G014
  • C03B8/04@K
  • Characterized by base substances HB CC 4G014
  • C03B8/04@L
  • Characterized by antecedent processes HB CC 4G014
  • C03B8/04@M
  • .Characterized by dehydration processes HB CC 4G014
  • C03B8/04@N
  • .Characterized by liquid dipping or submerging processes HB CC 4G014
  • C03B8/04@P
  • Characterized by environments (sintering environment, heat treatment environment) HB CC 4G014
  • C03B8/04@Q
  • characterised by maintenance or control of arrangements for manufacture (washing, repairing or detecting faults with apparatus) HB CC 4G014
  • C03B8/04@R
  • Characterized by structures or physical properties of antecedents or products (bubbles, cords, impurities, light absorption) HB CC 4G014
  • C03B8/04@Z
  • Others HB CC 4G014
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