| ReturnTo Theme-Group-Choice | Onelevelup |
| 5F064 | DESIGN AND MANUFACTURE OF INTEGRATED CIRCUITS (IC) | |
| H10D89/10 -89/10@Z | ||
| H01L21/82-21/82@Z | AA | AA00 TYPES OF INTEGRATED CIRCUITS |
AA01 | AA02 | AA03 | AA04 | AA05 | AA06 | AA07 | AA08 | AA10 | |
| . Custom integrated circuits (IC) | . . Semi-custom integrated circuits (IC) | . . . Master slices or gate arrays | . . . Reference cells or standard cells | . . . . Polycells | . . . . Building blocks | . . . PLA | . . . . FPLA | . Full wafer elements | ||||
| AA11 | AA13 | AA15 | AA17 | AA20 | ||||||||
| . Multichip microcircuits | . Three-dimensional elements | . Hybrid integrated circuits | . Printed circuit board | . Other types of integrated circuits * | ||||||||
| BB | BB00 INTEGRATED CIRCUIT FUNCTIONS |
BB01 | BB02 | BB03 | BB04 | BB05 | BB06 | BB07 | BB09 | BB10 | ||
| . Digital-signal processing | . . Logic gates | . . . AND gates | . . . OR gates | . . . NAND gates | . . . NOR gates | . . . NOT or inverter gates | . . Central processing unit (CPU) | . . One-chip microcomputers | ||||
| BB12 | BB13 | BB14 | BB15 | BB16 | BB18 | BB19 | BB20 | |||||
| . . Memory | . . . Random-access memories (RAM) | . . . . Dynamic random-access memories (DRAM) | . . . Read-only memories (ROM) | . . Address decoders | . . Shift registers | . . Flip-flops | . . Counters or frequency dividers | |||||
| BB21 | BB22 | BB23 | BB24 | BB26 | BB27 | BB28 | BB30 | |||||
| . Analog-signal processing | . . Amplifiers | . . . Sense amplifiers | . . . Operational amplifiers | . . Buffers | . . . Input buffers | . . . Output buffers | . . Level conversion | |||||
| BB31 | BB33 | BB35 | BB37 | BB40 | ||||||||
| . Testing | . Monitoring | . Safety | . Switching | . Other * | ||||||||
| CC | CC00 ELEMENTS USED |
CC01 | CC02 | CC03 | CC04 | CC06 | CC07 | CC08 | CC09 | CC10 | ||
| . Transistors | . . Bipolar transistors | . . . Emitter coupled logic (ECL), current-mode logic (CML) elements | . . . Integrated-injection logic (I2L) elements | . . Field-effect transistors (FET) | . . . Junction field-effect transistors (JFET) | . . . Schottky field-effect transistors (FET) | . . . Metal oxide semiconductor field-effect transistors (MOSFET) (including metal-insulator-semiconductor (MIS) field-effect transistors) | . . . . Transistors with polysilicon gates | ||||
| CC12 | CC13 | CC14 | CC15 | CC16 | ||||||||
| . . . . Complementary metal-oxide semiconductors (CMOS) | . . . Specific depletion or enhancement types | . . . . Enhancement-depletion metal-oxide semiconductors (EDMOS) | . . Bipolar metal-oxide semiconductors (BiMOS) | . . . Bipolar complementary metal-oxide semiconductors (bi-CMOS) | ||||||||
| CC21 | CC22 | CC23 | CC25 | CC26 | CC30 | |||||||
| . Diodes | . Resistors | . Capacitors | . Variants that use material other than silicon | . . Gallium arsenide (GaAs) | . Other elements used * | |||||||
| DD | DD00 INTEGRATED CIRCUIT STRUCTURES OTHER THAN WIRING |
DD01 | DD02 | DD03 | DD04 | DD05 | DD07 | DD08 | DD09 | DD10 | ||
| . Disposition or layout of elements, cells, blocks, or the like | . . Automatic disposition or layout | . . Optimization | . . Hierarchical structures | . . Disposition or layout within unit cells or blocks | . . Sizes of elements, cells, or blocks | . . . Enlargement or reduction | . . . Element size | . . Shapes of elements, cells, or blocks | ||||
| DD12 | DD13 | DD14 | DD15 | DD16 | DD18 | DD19 | DD20 | |||||
| . . Direction or angles of elements, cells, or blocks | . . Number or density of elements, cells, or blocks | . . Location or coordinates of elements, cells, or blocks | . . . Symmetry | . . . . Line symmetry | . . Arrangement or pitch of elements, cells, or blocks | . . . Arrays | . . . Blocks | |||||
| DD22 | DD24 | DD25 | DD26 | |||||||||
| . . . Close-packed cells | . . Distance between elements, cells, or blocks | . . Input/output terminals of elements, cells, or blocks | . . Handling of unused elements, cells, or blocks | |||||||||
| DD31 | DD32 | DD33 | DD34 | DD35 | DD36 | DD37 | DD39 | |||||
| . Structures that involve elements, cells, or blocks for specific uses | . . Use for input and output | . . . Both input and output | . . Use for power sources | . . . Voltage sources | . . . . Generation of reference voltages | . . . Current sources | . . Testing | |||||
| DD41 | DD42 | DD43 | DD44 | DD45 | DD46 | DD47 | DD48 | DD50 | ||||
| . Structures that involve additional elements | . . Bonding pads | . . . Pad spacing | . . . Power-source pads | . . . Unused pads | . . . Pads for testing | . . Identification marks | . . Passivation and protective films | . Other integrated circuit structures | ||||
| EE | EE00 WIRING |
EE01 | EE02 | EE03 | EE04 | EE05 | EE06 | EE08 | EE09 | EE10 | ||
| . Wiring patterns | . . Automatic wiring | . . Optimization of wiring | . . Application of graph theory | . . Wiring in or on unit cells or blocks | . . . Wiring in unused cells or blocks | . . Length of wiring | . . Width of wiring | . . . Width of wiring in relation to current | ||||
| EE12 | EE13 | EE14 | EE15 | EE16 | EE17 | EE18 | EE19 | EE20 | ||||
| . . Mesh or grid wiring | . . . Grid points | . . Wiring spaces | . . Number of wires or wiring density | . . Direction or angle of wiring | . . Wiring location or coordinates | . . . Wiring symmetry | . . Wiring arrangement or spacing | . . Wiring termination | ||||
| EE22 | EE23 | EE24 | EE25 | EE26 | EE27 | EE28 | ||||||
| . . Multi-layer wiring | . . . Wiring of three or more layers | . . . Combinations of fixed and pass-through wiring | . . . Use of diffusion layers | . . . Vertical positional relationships | . . . Contact means | . . . Double-sided patterns | ||||||
| EE31 | EE32 | EE33 | EE34 | EE35 | EE36 | |||||||
| . Wiring materials | . . Metals | . . . Aluminum (Al) | . . . Refractory metals | . . . Silicides | . . Polysilicon | |||||||
| EE41 | EE42 | EE43 | EE44 | EE45 | EE46 | EE47 | EE48 | |||||
| . Physical properties of wiring or between wires | . . Wiring resistance | . . Electrostatic capacitance | . . Inductance | . . Noise | . . . Crosstalk | . . Delay time | . . Heat generation | |||||
| EE51 | EE52 | EE53 | EE54 | EE56 | EE57 | EE58 | EE60 | |||||
| . Wiring for specific applications | . . Power-source or ground wiring | . . Wiring for bonding pads | . . Clock wiring | . Insulation or separation | . Temporary wiring | . Wiring sequence | . Other wiring | |||||
| FF | FF00 SWITCHING AND SELECTION |
FF01 | FF02 | FF04 | FF05 | FF06 | FF07 | FF08 | FF09 | |||
| . Purpose of switching or selection | . . Switching in redundant systems | . . Characteristics or functions of switching | . . . Switching of resistance values | . . . Switching of electrostatic capacitance | . . . Switching of current or power | . . . Switching of voltage | . . . Switching of the time delay | |||||
| FF12 | FF13 | FF14 | FF15 | FF16 | ||||||||
| . . Testing or monitoring | . . . Generation of test signals | . . . Self-diagnosis | . . . Checking to see if redundant systems are used | . . . Checking of product type or process | ||||||||
| FF21 | FF22 | FF23 | FF24 | FF26 | FF27 | FF28 | FF29 | FF30 | ||||
| . Elements in switching or selection portions | . . Diodes | . . Transistors | . . . Field-effect transistors (FET) | . . Fuses | . . . Disconnection of fuses | . . . Connection of fuses | . . . Fuses made of specific materials | . . . . Polysilicon | ||||
| FF32 | FF33 | FF34 | FF36 | |||||||||
| . . . . Metals | . . . . . Refractory metals | . . . Specific shapes | . . Switches or electric circuits | |||||||||
| FF41 | FF42 | FF43 | FF44 | FF45 | FF46 | FF47 | FF48 | FF49 | FF50 | |||
| . Methods for execution of switching or selection | . . Laser irradiation | . . . Irradiation intensity | . . Electron-beam irradiation | . . Feeding or changing of voltage or current | . . . Changing of voltage input to terminals | . . Preheating | . . Formation or change of wiring | . . . Bonding | . . Division of chips | |||
| FF52 | FF60 | |||||||||||
| . . Use of software or programs | . Other switching and selection | |||||||||||
| GG | GG00 TECHNOLOGY RELATED TO MANUFACTURING PROCESSES |
GG01 | GG03 | GG05 | GG07 | GG10 | ||||||
| . Diffusion or ion implantation | . Etching | . Crystal or epitaxial growth | . Heat treatment or annealing | . Other technologies | ||||||||
| HH | HH00 COMPUTER-ASSOCIATED TECHNOLOGY IN DESIGN AND MANUFACTURING |
HH01 | HH02 | HH03 | HH05 | HH06 | HH07 | HH08 | HH09 | HH10 | ||
| . Technology related to hardware | . . Host and terminal configurations | . . Clock signals | . Technology related to software or programs | . . Computer-aided design (CAD) | . . . Interactive systems | . . Languages used | . . Simulation | . . Evaluation, inspection, testing, or monitoring | ||||
| HH11 | HH12 | HH13 | HH14 | HH15 | HH16 | HH17 | HH18 | HH19 | HH20 | |||
| . . File structures or handling | . . Use of libraries | . Input | . Output or display | . . Graphic display | . . . Enlarged or reduced display | . . Display related to warning or monitoring | . . Help or menu display | . . Color display | . Other computer-assisted technology |