F-Term-List

5F031 Containers, movement, fixing, and positioning of semiconductor wafers
H01L21/68 -21/68@Z
H01L21/68-21/68@Z CA CA00
PROCESSING OBJECTS
CA01 CA02 CA04 CA05 CA07 CA09
. Circular boards . . Wafers . Rectangular boards . . Glass boards or liquid crystal boards . Masks or reticles . Flexible boards or films
CA11 CA13 CA15 CA17 CA20
. Dummy or monitoring wafers, or the like . Chips, pellets or dies . Lead frames . Finished products after being moulded or sealed . Other objects
DA DA00
KINDS OF CONTAINERS
DA01 DA03 DA05 DA08 DA09
. Carriers or cassettes . . for use in immersion processing (also classified in HA72) . Trays for horizontal arrangement . Box-shape containers for housing a plurality of wafers, or the like. . . Cases for housing wafers with carriers
DA11 DA12 DA13 DA15 DA17 DA19 DA20
. for one sheet or piece . . Box shape or case shape . . Open type frames or holding frames or the like . Protective tapes . Shelves, stockers, cabinets or lockers . Packages, e.g. boxes for transportation, sealing bags . Other containers
EA EA00
STRUCTURES OF CONTAINERS
EA01 EA02 EA03 EA04 EA06 EA07 EA09 EA10
. Materials . . using resins whose materials are specified . . . characterised by fillers, additives, or the like. . . . having coating layers . characterised by the structure of carrier grooves . . Inclined supports . Structures for preventing housed objects from coming out excluding EA07 . Pressure members, spacers or cushions for preventing rattling
EA11 EA12 EA14 EA16 EA18 EA19 EA20
. Lid structures . . characterised by engaging parts between lids and bodies . Airtight structures including ones having ventilatory functions . Information indicator parts, or information storage parts or built-in memories . Other structural features . . Inside of containers . . Outside of containers
FA FA00
FORMS OF TRANSFER
FA01 FA02 FA03 FA04 FA05 FA07 FA09
. Transfer of wafers including dummies . Transfer of boards including dummies other than wafers . Transfer of containers . Transfer of masks or reticles . Other transfers . for each single sheet or piece, or sheet type . Batch transfer of a plural sheets or pieces
FA11 FA12 FA13 FA14 FA15 FA17 FA18 FA19 FA20
. Deliveries between containers and transfer means . Deliveries between transfer means and securing or retaining parts during processing . Deliveries between transfer means . . transferring directly between transfer means . . with intervention of relay parts, e.g. mounting stands . characterised by attitude during transferring . . vertical or inclined states . . . carried in and out from containers in vertical directions . . Reversed state
FA21 FA22 FA24 FA25 FA30
. rotating between horizontal and vertical states, or reversing from front to back . . rotating or reversing transfer objects together with containers . changing spaces or pitches . . changing spaces of transfer objects while retaining them in transfer means . Overlapping or peeling of wafers
GA GA00
TRANSFER DEVICES OR MEANS
GA01 GA02 GA03 GA04 GA05 GA06 GA07 GA08 GA09 GA10
. Retaining parts . . Forks . . . having a plurality of forks . . . . capable of moving each fork independently . . . characterised by the shape of parts for retaining wafers or the like . . . . partially retaining with claws, protrusions, or the like or limitation of contact surfaces . . . characterised by mechanisms for fixing wafers or the like on forks . . . . vacuum adsorption . . . . electrostatic adsorption . . . . Gripping or sandwiching (also classified in GA12-16)
GA12 GA13 GA14 GA15 GA16 GA18 GA19 GA20
. . by gripping or sandwiching . . . characterised by the structure of contact parts with retention objects . . . characterised by opening or closing mechanisms of claws or fingers . . . gripping end faces . . . gripping front and back sides . . Hooks . . . hanging accessories for containers . . . . hand-held
GA22 GA23 GA24 GA25 GA26 GA28 GA30
. . by vacuum adsorption excluding GA08 . . . for chips or collets . . . for wafers or other boards . . . other than for wafers, boards or chips . . . characterised by adsorption surface structures . . Bernoulli's chuck . . Other retention mechanisms
GA32 GA33 GA35 GA36 GA37 GA38 GA40
. . characterised by the material of retaining parts . . characterised by the methods of manufacturing or processing retaining parts . . Transfer devices incorporated in additional mechanisms . . . Sensors (see viewpoint JA) . . . Heating or cooling functions . . . Positioning mechanisms by pressing transferring objects against moulds (see viewpoint KA) . . having a plurality of retaining parts that are usable by switching
GA41 GA42 GA43 GA44 GA45 GA46 GA47 GA48 GA49 GA50
. Arm parts . . Drive mechanisms . . . Link mechanisms . . . Pantagraph mechanisms . . . Articulated robot arms or manipulators . . Operations . . . Rotatable arms . . . Entire arm support parts transferring in the horizontal direction . . . Entire arm support parts transferring in the vertical direction . . having a plurality of arms
GA51 GA52 GA53 GA54 GA55 GA56 GA57 GA58 GA59 GA60
. Belts or chains . Walking beams or feed claws . Rollers . Rotary tables . Pressures or pushrods . Use of inclined surfaces . Hand trucks (Flotation types are classified in GA61-65.) . . Unmanned carriers . . controlling the travel of hand trucks or unmanned carries . Other mechanical transfers
GA61 GA62 GA63 GA64 GA65 GA67 GA68 GA69
. Floating transfer . . Use of jets . . . characterised by the arrangement or structure of nozzles . . using magnetism . . . Linear motors . Hand-held tweezers . . Grips . . Adsorption
HA HA00
SECURING OR RETAINING DURING PROCESSING
HA01 HA02 HA03 HA05 HA06 HA07 HA08 HA09 HA10
. Stages, chucks or susceptors . . characterised by the material of stages or the like . . characterised by the manufacturing methods or processing methods of stages or the like . . characterised by the contact surfaces with wafers or the like . . . Projecting shapes . . . Recessed shapes . . . Unevenness or protrusions for limiting contact surfaces . . . retaining wafers or the like while exposing the back side thereof . . . only contact surfaces being different materials
HA12 HA13 HA14 HA16 HA17 HA18 HA19
. . Securing or retaining mechanisms . . . Vacuum adsorption . . . . characterised by the arrangement or structure of adsorption holes or grooves . . . Electrostatic adsorption . . . . characterised by electrode parts . . . . . characterised by the shape or arrangement of electrodes . . . . characterised by power sources or feeding parts
HA23 HA24 HA25 HA26 HA27 HA28 HA29 HA30
. . . Clamp or grip . . . . gripping partially the periphery of wafers or the like, e.g. claw shape members . . . . gripping the whole periphery of wafers or the like, e.g. ring shape members . . . . Method of pressing wafers or the like . . . . . pressing end faces by opening and closing claw shape pressing members . . . . . pressing front and back sides by pinching them with placing parts and pressing members . . . . . characterised by methods or mechanisms of generating pressing force . . . . . . using elastic materials, e.g. springs
HA32 HA33 HA34 HA35 HA37 HA38 HA39 HA40
. . releasing securing forces or separating from retention surfaces . . . Lift pins (Chip push-up is classified in MA40.) . . . Gas jet . . . removing residual charges in electrostatic adsorption . . Heating mechanisms . . Cooling mechanisms . . supplying heat-conductive gases in the clearance between stages and wafers or the like . . . having grooves for gas diffusion
HA42 HA44 HA45 HA46 HA48 HA50
. . Batch retention of a plurality of wafers or the like . . having securing or retaining surfaces facing other than horizontally upward . . . vertical . . . downward . . for wet treatment ( Immersion is classified in HA71.) . . characterised by the mounting on processing device bodies
HA52 HA53 HA55 HA56 HA57 HA58 HA59 HA60
. . Operations . . . Fine-adjustment tables or precise positioning . . . . suppressing or removing the vibration of fine-adjustment tables . . . Operations of stages other than fine-adjustment tables . . . . Transfer in horizontal directions . . . . Transfer in vertical directions . . . . Rotation . . . . Stages combined with a mechanism for carrying processing objects in/out of a processing chamber
HA61 HA62 HA63 HA64 HA65 HA66 HA67
. Heat treatment boats . . characterised by materials . . characterised by manufacturing methods . . characterised by structures . . . characterised by the structures of grooves or contacting parts with wafers . . . . supporting wafers in an inclined state . . Retaining or transferring of boats
HA71 HA72 HA73 HA74 HA78 HA80
. relating to immersion treatments into liquid tanks . . Immersion of wafers or the like while they are retained in containers or jigs . . Immersion of wafers or the like while they are directly retained in retaining parts . . characterised by draining methods or draining structures . Tapes or films . Other securing or retaining
JA JA00
DETECTION
JA01 JA02 JA03 JA04 JA05 JA06 JA07 JA08 JA09 JA10
. Means or sensors . . Optical sensors . . . Line sensors . . . Area sensors or cameras . . . Detection of transmitted light . . . Detection of reflected light . . . characterised by optical path formation . . Contact type sensors or pressure-sensitive sensors . . Ultrasonic sensors or electrostatic capacitance sensors . . Pressure sensors
JA12 JA13 JA14 JA15 JA17 JA19
. . Detection objects and sensors relatively moving during detection . . . Movable sensors . . . Movable detection objects . . . Rotatary detection objects such as wafers . . mounting a plurality of sensors relative to one detection object . . Batch detection of a plurality of detection objects with a plurality of sensors
JA21 JA22 JA23 JA25 JA27 JA28 JA29 JA30
. Detection purposes . . Presence or absence of existence, or existing positions, e.g. addresses . . . Objects being grooves of boats or carriers, or housed wafers or the like. . . Displacement in containers, e.g. inclination or extrusion . . Deviations of securing or retaining position . . . Deviations of direction or orientation . . . Centre deviations . . . Height deviation or inclination
JA31 JA32 JA33 JA34 JA35 JA36 JA37 JA38 JA39 JA40
. Detected information . . Dimensional information, e.g. distance, thickness or angle . . Information on shapes . . . Orientation flats . . . Notches . . . Edges or end faces excluding JA34 and JA35 . . . Characteristic patterns . . . . Positioning marks . . . . Scribe lines . . . Overviews, outward appearances or sizes
JA42 JA43 JA45 JA46 JA47 JA49 JA50
. . Front and back sides . . The number of sheets or pieces . . Physical quantities . . . Temperature . . . Pressure . . Identification information, e.g. bar codes or memory information . . . Information added to wafers and boards
JA51
. characterised by processing of detected signals
KA KA00
POSITIONING
KA01 KA02 KA03 KA04 KA05 KA06 KA07 KA08 KA10
. moving only wafers or the like . . pressing objects against moulds . . Tapers, steps or positioning pins . . Rotation by rollers . moving objects to be positioned together with placing parts such as stages . . Horizontal directions or X to Y . . Vertical directions or Z, or inclination . . Rotation or theta . controlling transfer means to move wafers or the like
KA11 KA12 KA13 KA14 KA15 KA17 KA18 KA20
. aligning centres . aligning directions or orientations . . aligning orientation flats . . aligning notches . Other positioning of wafers or boards . characterised by attitude in positioning, e.g. inclined state . positioning in two steps or more . Positioning of objects other than wafers or boards
LA LA00
OPERATION MECHANISMS OR THE LIKE
LA01 LA02 LA03 LA04 LA06 LA07 LA08 LA09 LA10
. characterised by bearings or sliding parts . . Contactless support or floating support . . . by jets . . . using magnetic forces . characterised by power sources . . Motors . . . Linear motors excluding GA65 . . . Stepping motors . . Piezoelectric effect
LA11 LA12 LA13 LA14 LA15 LA16 LA18
. Power transmission mechanisms . . Ball screws or transfer screws . . Belts or chains . . Gears . . Cylinders or pistons . . Links or pantagraph mechanisms excluding GA43 and GA44 . characterised by cable parts, e.g. signals or sources
MA MA00
PROCESSING DEVICES
MA01 MA02 MA03 MA04 MA06 MA07 MA09
. Devices or modules comprising an integration of a plurality of processing units . . integrated in the upward and downward directions . . horizontally integrated . . . Radial arrangement . combining a plurality of devices or modules via transfer paths . . characterised by interface parts between devices and transfer paths . characterised by the layout of each device or device groups (specified mutual positional relations or arrangements between devices or device groups)
MA11 MA13 MA15 MA16 MA17
. characterised by parts for loading wafers or the like on devices . . characterised by transfer systems of loading parts . . characterised by loading devices with containers, e.g. carriers . . . characterised by the arrangements, e.g. position, direction of containers . . . characterised by fixing of containers to devices
MA21 MA22 MA23 MA24 MA25 MA26 MA27 MA28 MA29 MA30
. Processes . . Polishing . . Cleaning (Cleaning of containers or transfer mechanisms is classified in PA24.) . . Wet etching or developing . . Plating . . Resist coating or other spin coating . . Exposure . . CVD or diffusion . . PVD, e.g. sputtering or vacuum deposition . . Heat treatment or annealing
MA31 MA32 MA33 MA34 MA35 MA37 MA38 MA39 MA40
. . Ion implantation . . Dry etching . . Tests, measurements or inspections . . Dicing or scribing . . Bonding or mounting . . Adhesion of tapes . . Tape peeling . . . Adhesion-reducing treatments . . . Chip push-up
NA NA00
ATMOSPHERE CONTROL
NA01 NA02 NA03 NA04 NA05 NA07 NA08 NA09 NA10
. Atmosphere . . Clean air . . . characterised by the formation or introduction of air . . Inert gas . . Vacuum . Loading and unloading, or transfer in atmosphere . . characterised by transfer tunnels or clean tunnel parts . . characterised by gate or shutter parts . . . characterised by the mechanisms for opening or closing lids of box-shape containers
NA11 NA13 NA14 NA15 NA16 NA17 NA18 NA20
. Monitoring of atmosphere including dust particles . Dust proof or dust removal . . Absorption . . Blowing off or ventilation . . . Control of airflow, e.g. direction . . making one space under positive pressure . . Dust proof covers or isolation of dust generating sources . Other atmosphere controls
PA PA00
SPECIAL PURPOSES
PA01 PA02 PA03 PA04 PA05 PA06 PA07 PA08 PA09 PA10
. Process control or production control . . Transfer control . . . controlling the timing of carrying transfer objects in and out of transfer parts . . . including control of processing devices as well . . responsive to processes or system changes . . Improvement of maintenance characteristics . . . facilitating the detachment and attachment, or replacement of members . . Malfunction prevention or safety supervision . . Improvement of operability, e.g. use of touch panels . . characterised by control during occurrence of errors or recovery methods
PA11 PA13 PA14 PA16 PA18 PA20
. responsive to adverse thermal effects . responsive to deformations or warpages of wafers or the like . . Improvement of flatness during securing of wafers to stages or the like . responsive to wafers or the like of irregular shapes or various sizes . responsive to upsizing of wafers or the like . Prevention of failures of wafers or the like
PA21 PA23 PA24 PA25 PA26 PA30
. Antistatic measures or electricity removal excluding HA35 . Contamination prevention excluding viewpoint NA . . cleaning containers or transfer mechanisms, or the like . . changing transfer retention parts for each process (see viewpoint GA) . . Prevention of elution or generation of contaminants from members . Other purposes
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