F-Term-List

C23C16/00-16/56

AA00
SPECIFIED MATERIAL GAS

AA01

AA02

AA03

AA04

AA05

AA06

AA07

AA08

AA09

AA10

. Specified main reaction gases

. . Main reaction gases containing halides

. . . Chlorides

. . . Fluorides

. . Main reaction gases containing hydrides

. . . Silanes

. . . Diboranes

. . . Phosphines

. . Main reaction gases containing hydrocarbon compounds

. . . Saturated hydrocarbons

AA11

AA12

AA13

AA14

AA16

AA17

AA18

AA20

. . Main reaction gases containing metal organic compounds

. . Main reaction gases containing metal carbonyl compounds

. . Main reaction gases containing ammonia

. . Main reaction gases containing oxygen carbon monoxide or carbon dioxide

. Specified carrier gases

. . Hydrogen -based carrier gases

. . Nitrogen -based carrier gases

. Specified doping gases

AA22

AA24

. using sensitisers

. Others

BA00
SPECIFIED COATING MATERIAL

BA01

BA02

BA03

BA04

BA05

BA06

BA07

BA08

BA09

BA10

. Coatings containing metal components

. . Aluminium

. . Beryllium

. . Bismuth

. . Cobalt

. . Chromium

. . Iron

. . Gallium

. . Germanium

. . Hafnium

BA11

BA12

BA13

BA14

BA15

BA16

BA17

BA18

BA19

BA20

. . Indium

. . Molybdenum

. . Niobium or columbium

. . Nickel

. . Antimony

. . Tin

. . Tantalum

. . Titanium

. . Vanadium

. . Tungsten

BA21

BA22

BA24

BA25

BA26

BA27

BA28

BA29

BA30

. . Zinc

. . Zirconium

. Coatings containing non-metal components

. . Arsenic

. . Boron

. . Carbon

. . . Diamond-like carbon

. . Silicon

. . . Amorphous silicon

BA31

BA32

BA33

BA35

BA36

BA37

BA38

BA39

BA40

. . . Hydrogenated silicon

. . Selenium

. . Tellurium

. Coatings containing compound components

. . Carbides

. . . Silicon carbide

. . Nitrides

. . . Boron nitride

. . . Silicon nitride

BA41

BA42

BA43

BA44

BA45

BA46

BA47

BA48

BA49

BA50

. . Carbonitrides

. . Oxides

. . . Aluminium oxides

. . . Silicon oxides

. . . Tin oxides

. . . Titanium oxides

. . . Zinc oxides

. . Silicides

. . Borides

. . Sulfides

BA51

BA53

BA54

BA55

BA56

BA57

BA58

BA59

. . Phosphides

. Coatings containing components specified by the Periodic System

. . II elements

. . Group III elements

. . Group V elements

. . Group VI elements

. . Transition elements

. . Rare earth elements

BA61

. Others

BB00
SPECIFIED COATING STRUCTURE

BB01

BB02

BB03

BB04

BB05

BB06

. Specified crystal forms

. . comprising single crystals

. . comprising polycrystals

. . . comprising ultrafine crystals

. . amorphous or non-crystalline or non-crystals

. . comprising mixed crystals

BB11

BB12

BB13

BB14

. Specified coating forms

. . comprising multi-layered coatings

. . . comprising two-layered coatings

. . having partial coatings

CA00
SPECIFIED SUBSTRATE

CA01

CA02

CA03

CA04

CA05

CA06

CA07

CA08

. Specified materials of substrates

. . comprising metals or alloys

. . . comprising cemented carbides or cermets

. . comprising semiconductors

. . comprising ceramics

. . comprising glass

. . comprising plastics

. . comprising fibres

CA11

CA12

CA13

CA14

CA15

CA16

CA17

CA18

. Specified shape of substrates

. . Wafers films or foils

. . Wires filaments or fibres

. . Tubes

. . . Inner surfaces of tubes

. . . Outer surfaces of tubes

. . Strips straps or boards

. . Particles or powder

DA00
WITH PRETREATMENT OR AFTER-TREATMENT

DA01

DA02

DA03

DA04

DA05

DA06

DA08

DA09

. with pretreatment

. . with pretreatment of substrates

. . . Cleaning

. . . Etching

. . . Masking

. . with pretreatment of reaction chambers

. with after-treatment

. . Heat treatment

EA00
TREATMENT OF MATERIAL GAS

EA01

EA03

EA04

EA05

EA06

EA08

. relating to generation or supply of gases

. relating to introduction of gases to reaction chambers

. . Blowing nozzles

. . . Shape

. . . Arrangement

. stirring gases in reaction chambers

EA11

EA12

EA13

EA14

. exhausting gases from reaction chambers

. . Treatment or reuse of exhausted gases

. . . Recovery of valuable components from exhausted gases

. . . Recycle of exhausted gas

FA00
EXCITATION OR ACTIVATION OF MATERIAL GAS

FA01

FA02

FA03

FA04

FA06

FA07

FA08

FA10

. by plasma

. . by ECR plasma

. . by capacitively coupled plasma

. . by inductively coupled plasma

. by light

. . by laser

. . by ultraviolet or infrared light

. by heat

FA12

FA14

FA15

FA17

. by high-energy beam

. Combined use of exciting or activating means

. . using plasma and light

. Others

GA00
SUPPORTING OR CARRYING SUBSTRATE

GA01

GA02

GA03

GA04

GA05

GA06

GA07

GA08

GA09

. Supporting substrates

. . Supports susceptors or bases per se

. . Inclined supports for substrates

. . Movable supports for substrates

. . . Rotating supports for substrates

. . . . Rotating supports for substrates in horizontal planes

. . . . Rotating supports for substrates in vertical planes

. . . substrates and supports moving relatively

. . . . substrates rotating relatively to supports

GA11

GA12

GA13

GA14

. Carrying

. . Carrying substrates

. . . Boats per se

. . . Carrying continuous substrates

HA00
COATING TREATMENT

HA01

HA02

HA03

HA04

HA06

HA07

HA08

. Multi-step processes

. . including coating steps other than CVD

. . . CVD as pre-steps or upstream steps

. . . CVD as post-steps or downstream steps

. using electric or magnetic fields

. . using electric fields only

. . using magnetic fields only

HA11

HA12

HA13

HA14

HA15

HA16

HA17

. with detection measurement or control

. . Objects to be detected measured or controlled

. . . Coatings or substrates

. . . . Coatings only

. . . Material gases

. . . excitation or activation of material gases

. . performing only detection or measurement

JA00
TREATMENT CONDITION

JA01

JA02

JA03

JA04

JA05

JA06

JA07

JA08

JA09

JA10

. Length or thickness

. Position

. Distance or spacing

. Direction or angle

. Flow rate

. Density composition or ratio

. Distribution

. Gradient

. Pressure or vacuum

. Temperature

JA11

JA12

JA13

JA14

JA15

JA16

JA17

JA18

JA19

JA20

. Time

. Speed

. Strength

. Electric fields

. Magnetic fields

. Electric power

. Voltages

. Frequencies

. Phases

. Others

KA00
REACTOR

KA01

KA02

KA03

KA04

KA05

KA06

KA08

KA09

KA10

. Types of reaction chambers

. . Horizontal reaction chambers

. . . of diffusion furnace types

. . Vertical reaction chambers

. . Cylindrical reaction chambers

. . Suspended or inverted reaction chambers

. relating to reaction chambers

. . Reaction tubes or furnace tubes per se

. . Sealing devices

KA11

KA12

KA14

KA15

KA16

KA17

KA18

KA19

KA20

. . Opening and closing devices

. . Diffusion partition or shielding plates

. Electrodes

. . Shape

. . . Cylindrical electrodes

. . Electrodes combined with blowing nozzles

. . Electrodes combined with substrates

. . Auxiliary electrodes

. . . Bias electrodes

KA22

KA23

KA24

KA25

KA26

KA28

KA30

. Heating or cooling devices

. . Heating substrates or supports

. . . Heating substrates only

. . Heating material gases

. . Cooling

. Vacuum devices

. Plasma generators

KA32

KA34

KA36

KA37

KA39

. Electric field generators

. Magnetic field generators

. Optical devices

. . Windows or mirrors

. Detecting or measuring devices

KA41

KA43

KA45

KA46

KA47

KA49

. Control devices

. Safety devices

. Component parts of devices

. . Materials thereof

. . . having coating layers

. Others

LA00
CHARACTERISTICS OR USE OF FILM

LA01

LA02

LA03

LA04

LA05

LA06

LA07

. relating to characteristics of films

. . Insulating films

. . Superconductive films

. . Photoconductive films

. . Magnetic films

. . . Soft magnetic films

. . . Hard magnetic films

LA11

LA12

LA13

LA14

LA15

LA16

LA17

LA18

LA19

LA20

. relating to use

. . Compound semiconductors

. . . Group II-VI compound semiconductors

. . . Group III-V compound semiconductors

. . Integrated circuits

. . Photo-voltaic elements

. . Electrophotographic photosensitive bodies

. . Display elements

. . Recording medium

. . . Magnetic recording medium

LA21

LA22

LA23

LA24

LA25

LA26

. . Tools

. . . Cutting tools

. . Sliding members

. . Ornaments or household implements

. . Particles powder or sintered bodies

. . Electromagnetic steel sheets

4K030	CHEMICAL VAPOUR DEPOSITION (CVD)
	C23C16/00 -16/56