F-Term-List

C23C14/00-14/58@Z

AA00
SUBSTRATE

AA01

AA02

AA04

AA05

AA06

AA07

AA08

AA09

. Materials

. . Metallic materials

. . Inorganic materials

. . . Boron

. . . Silicon

. . . Aluminium oxide (Al2O3)

. . . Silicon dioxide or silica

. . . Glass

AA11

. . Organic materials

AA21

AA22

AA23

AA24

AA25

AA26

AA27

AA29

. Shape

. . Grains powders or spheres

. . Wires

. . Sheets

. . Films strips or long bodies

. . Containers

. . Tubes

. having differences in surface levels

BA00
COATING MATERIAL

BA01

BA02

BA03

BA04

BA05

BA06

BA07

BA08

BA09

BA10

. Metallic materials

. . Elemental metals

. . . Aluminium

. . . Silver

. . . Gold

. . . Cobalt

. . . Chromium

. . . Copper

. . . Iron

. . . Indium

BA11

BA12

BA13

BA14

BA15

BA16

BA17

BA18

. . . Molybdenum

. . . Nickel

. . . Platinum

. . . Antimony

. . . Tin

. . . Tantalum

. . . Titanium

. . . Zinc

BA21

BA22

BA23

BA24

BA25

BA26

. . Alloys

. . . Alloys based on noble metals

. . . Alloys based on aluminium

. . . Alloys based on cobalt

. . . Alloys based on nickel

. . . Alloys based on iron

BA31

BA32

BA33

BA34

BA35

. Inorganic materials

. . Elements

. . . Boron

. . . Carbon

. . . Silicon

BA41

BA42

BA43

BA44

BA45

BA46

BA47

BA48

BA49

BA50

. . Compounds

. . . Fluorides

. . . Oxides

. . . . Aluminium oxides (AlO)

. . . . Indium oxides (InO)

. . . . Silicon oxides (SiO)

. . . . Tin oxides (SnO)

. . . . Titanium oxides (TiO)

. . . . Zinc oxides (ZnO)

. . . . Double oxides

BA51

BA52

BA53

BA54

BA55

BA56

BA57

BA58

BA59

BA60

. . . Sulfides

. . . Silicides

. . . Borides

. . . Carbonitrides

. . . Carbides

. . . . Silicon carbide (SiC)

. . . . Tungsten carbide (WC)

. . . Nitrides

. . . . Boron nitride (BN)

. . . . Titanium nitride (TiN)

BA62

BA64

. Organic materials

. Mixtures

BB00
COATING STRUCTURE

BB01

BB02

BB03

BB04

BB07

BB08

BB09

BB10

. Coating form

. . Multi-layer coating

. . Partial or patterned coating

. . Double-sided coating

. Crystal structure

. . Polycrystalline

. . Monocrystalline

. . Non-crystalline or amorphous

BC00
COATING PROPERTY

BC01

BC02

BC03

BC04

BC05

BC06

BC07

BC08

BC09

BC10

. Corrosion resistance

. Abrasion resistance

. Conductivity

. . Superconductivity

. Electrical resistance

. Magnetic properties

. Optical properties

. . Translucency or transparency

. Transparency and conductivity

. Thermal properties

BD00
USE OF COATING

BD01

BD02

BD03

BD04

BD05

BD06

BD07

BD08

BD09

BD10

. Semiconductor devices

. . Lead frames or wiring materials

. Mechanical parts

. . Sliding members

. Tools

. Decorative articles

. Clock parts

. Photosensitive materials for electrophotography

. Reflective mirrors or reflective films

. Transfer foils

BD11

BD12

. Magnetic recording media

. . Photomagnetic recording media

CA00
COATING TREATMENT METHOD

CA01

CA02

CA03

CA04

CA05

CA06

CA07

CA08

CA09

CA10

. Vacuum deposition

. . Reactivity

. Ion plating or ion beam vapour deposition

. . Reactivity

. Sputtering

. . Reactivity

. Ion beam mixing

. . using both sputtering and ion beam irradiation

. . using both vapour deposition and ion beam irradiation

. Ion implantation

CA11

CA12

CA13

CA15

CA17

. Polymerisation of organic monomers

. . using plasma

. providing the substrate with bias potential

. Diagonal irradiation of substrates by particle beams

. Vibration or rotation of substrate

DA00
TREATMENT APPARATUS IN GENERAL

DA01

DA02

DA03

DA04

DA05

DA06

DA08

DA09

DA10

. Cells or bell jars

. Vacuum discharge apparatuses

. Monitoring apparatuses in cells

. Gas introducing apparatuses

. . Blow-out nozzles

. . . Arrangement

. Apparatus for heating substrates

. Cleaning apparatuses in cells

. . Bodies to prevent adherence of particles

DA12

DA13

. Shutter apparatuses

. . Composite shutters

DB00
VAPOUR DEPOSITION APPARATUS

DB01

DB02

DB03

DB04

DB05

DB06

DB07

DB08

DB09

DB10

. Evaporation materials or substances

. . Materials

. . . Elemental metals

. . . Alloys

. . . Inorganic compounds

. . . Organic substances

. . Shape

. . . Pellets sheets or rods

. . . Wires or filaments

. . . Powders or grains

DB11

DB12

DB13

DB14

DB15

DB17

DB18

DB19

DB20

. Crucibles or evaporating material containers

. . Shape or structure

. . Materials

. . having multiple crucibles

. Evaporating materials supply means

. Evaporating materials heating apparatus

. . Resistance heating

. . Induction heating

. . Lasers

DB21

DB22

DB23

DB24

. . Electron beams

. . . Beam scanning

. . . Rotation or movement of crucible

. . . cooling crucible

DC00
SPUTTERING APPARATUS

DC01

DC02

DC03

DC04

DC05

DC06

DC07

DC08

DC09

. Targets

. . Materials

. . . Elemental metals

. . . Alloys

. . . Inorganic compounds

. . . Organic substances

. . Manufacturing methods

. . . Melting and casting

. . . Sintering

DC12

DC13

DC15

DC16

DC18

DC20

. . Shapes

. . . Tubular or rod-shaped

. . Composite targets

. . having multiple targets

. Sputter guns or S-guns

. Grounding shields or shield rings

DC21

DC22

DC23

DC24

DC25

DC26

DC27

DC28

DC29

DC30

. Packing plates

. . Target mounting

. . . using jigs

. . . using brazing or soldering

. . Cooling mechanisms

. Sputtering methods

. . using discharge plasma

. . . Electrode arrangement

. . . . Double pole systems

. . . . . Coaxial types

DC31

DC32

DC33

DC34

DC35

DC37

DC39

DC40

. . . . Three or four pole systems

. . . . Opposing target types

. . . Power sources

. . . . Direct current

. . . . High frequency

. . Ion beam sputtering

. . Magnetron sputtering

. . . using permanent magnets

DC41

DC42

DC43

DC44

DC45

DC46

DC48

. . . using electromagnets

. . . Magnet shape or structure

. . . Magnet arrangement

. . . Relative motion of targets or magnets

. . . . Rotation of targets or magnets i.e. rotation or revolution

. . . . Movement of targets or magnets i.e. vertical or horizontal

. . Electron cyclotron resonance (ECR) application using microwaves

DD00
ION PLATING APPARATUS

DD01

DD02

DD03

DD04

DD05

DD06

. Direct current discharge

. High frequency discharge

. Cluster ion beam

. Thermionic cathode

. Hot-carrier diode (HCD) types having electron guns

. Arc discharge

DE00
ION IMPLANTATION OR ION BEAM MIXING APPARATUS

DE01

DE02

DE03

DE04

DE05

DE06

. Ion beam generators

. . Ion sources

. . Ion separators

. . Ion accelerators

. Ion beam deflectors

. Ion beam scanners

EA00
MEASUREMENT OR CONTROL

EA01

EA02

EA03

EA04

EA05

EA06

EA07

EA08

EA09

. Film thickness

. Evaporating or sputtering speed

. Gas pressure or degree of vacuum

. Gas flow rate

. Gas composition

. Plasma

. Vapour flow distribution

. Substrate temperature

. Power supply

FA00
PRETREATMENT

FA01

FA02

FA03

FA04

FA05

FA06

FA07

FA09

. Pretreatment of substrates

. . Roughening

. . Smoothing

. . Washing or cleaning

. . Discharge or plasma treatment

. . Heat treatment

. . Formation of resin backing or undercoating layers

. Pretreatment in tank

GA00
AFTER-TREATMENT

GA01

GA02

GA03

GA05

. Heat treatment

. Discharge or plasma treatment

. Formation of resin layers or top coat layers

. Separation of films from substrates

HA00
PARTIAL COATING METHOD

HA01

HA02

HA03

HA04

HA05

HA07

. using mechanical masks

. . Mask materials

. . Mask shape or structure

. . Mask fixing means

. using masking agents

. using resists

JA00
SUBSTRATE SUPPORT

JA01

JA02

JA03

JA05

JA06

JA08

JA10

. Substrate holders

. . Rotating mechanisms

. . . Planetary systems

. Means for attaching substrates to holders

. . using jigs

. Rotation of substrates per se

. Long support rollers

KA00
CONTINUOUS TREATMENT

KA01

KA02

KA03

KA05

KA06

KA07

KA09

. Transport of substrates

. . Substrate housing containers or cassettes

. . Transport rollers

. Sealing apparatuses

. . Liquid seals

. . Roll seals

. Feeding and discharging chambers of substrate or auxiliary vacuum chambers

4K029	PHYSICAL VAPOUR DEPOSITION
	C23C14/00 -14/58@Z