F-Term-List

G03F7/004-7/04;7/06,501;7/075-7/115;7/16-7/18

AA00
POLYFUNCTIONAL DIAZO PHOTOSENSITIVE COMPOUND OR POLYFUNCTIONAL AZIDE PHOTOSENSITIVE COMPOUND (AF01-AF09 TAKE PRECEDENCE)

AA01

AA02

AA04

AA06

AA07

. Polyfunctional diazonium compounds

. . Diazo resins

. Polyfunctional p-quinonediazide compounds

. Polyfunctional azide compounds

. . Bisazide compounds

AB00
INORGANIC PHOTOSENSITIVE COMPOUND

AB01

AB03

AB05

AB07

AB08

AB10

. Dichromates

. Inorganic resists

. Chalcogenides

. Photocatalysts

. . Titanium oxides

. Silver salts (AB05 takes precedence)

AC00
COMPOUND CONTAINING RADICAL POLYMERISABLE CARBON-TO-CARBON UNSATURATED GROUP

AC01

AC02

AC03

AC05

AC06

AC08

AC09

AC10

. Allyl groups

. . Macromolecules

. . . Polymers or copolymers of allyl acrylates or polymers or copolymers of allyl methacrylates

. Acrylamide groups or methacrylamide groups or acrylimide groups or methacrylimide groups

. . Macromolecules

. Vinyl ether groups or vinyl ester groups

. . polyvalent

. . . Macromolecules

AC11

AC12

AC13

AC15

AC17

AC19

. Vinylphenyl groups

. . Macromolecules

. . Divinylbenzenes

. Dienes

. Acetylenic unsaturated groups

. Maleic acid constitutions or maleimide groups

AC21

AC22

AC23

AC24

AC25

. Monoacryloyloxy groups or monomethacryloyloxy groups

. . Acrylic acids or methacrylic acids or their salts or anhydrides

. . Acryloyloxy alkyltrialkoxysilanes or methacryloyloxy alkyltrialkoxysilanes

. . Poly(oxyalkylenes)

. . Macromolecules (AC24 takes precedence)

AC31

AC32

AC33

AC34

AC35

AC36

AC37

AC38

. Polyvalent acryloyloxy groups or polyvalent methacryloyloxy groups

. . Alkylenediols

. . Trimethylolpropanes

. . Bisphenols (AC53 or AC54 takes precedence)

. . Pentaerythritols

. . Dipentaerythritols

. . Acrylates or methacrylates of urethane types (AC38 or AC57 takes precedence)

. . Isocyanurates

AC42

AC43

AC44

AC45

AC46

AC47

AC48

AC49

AC50

. . Addition polymers

. . . Acrylic compound units or methacrylic compound units

. . . . Acrylic acids or methacrylic acids or their salts halides anhydrides or alkyl ester units or cycloalkylester units

. . . . Units having acryloyloxy groups or methacryloyloxy groups in the side chain

. . . . . Units having acryloyloxy groups or methacryloyloxy groups introduced by epoxy groups

. . . . . Units having acryloyloxy groups or methacryloyloxy groups introduced by isocyanate groups

. . . Maleic acids or their salts halides anhydrides esters amide units or maleimide units

. . . Styrene compound units

. . . Vinyl alcohol units or vinyl acetate units

AC52

AC53

AC54

AC55

AC56

AC57

AC58

AC59

AC60

. . Polycondensates or polyaddition products

. . . Acrylic-modified epoxy resins or methacrylic-modified epoxy resins

. . . . further modified by acids

. . . Phenolic resins

. . . . Novolak resins (AC53 or AC54 takes precedence)

. . . Polyurethanes

. . . Polyesters (AC57 takes precedence)

. . . Macromolecules containing silicon in the main chain

. . . . Polysiloxanes or ladder polysiloxanes (AC67 or AC69 takes precedence)

AC62

AC63

AC64

AC65

AC66

AC67

AC68

AC69

AC70

. . . Polyethers (AC53 AC54 or AC57 takes precedence)

. . . . Poly(oxyalkylenes)

. . . . . Poly(oxyalkylene) diacrylates or poly(oxyalkylene) dimethacrylates

. . . Polyamides

. . . . Polyimide precursors

. . . . . containing siloxane chains in the main chain

. . . . Polybenzoxazole precursors

. . . . . containing siloxane chains in the main chain

. . . Polyimides or polybenzoxazoles

AC71

AC72

AC73

AC74

AC75

AC76

AC77

AC78

AC79

AC80

. Acidic groups

. . Carboxy groups (AC22 AC44 AC48 AC54 or AC66 takes precedence)

. . Phenolic hydroxyl groups (AC55 AC56 or AC68 takes precedence)

. Alcoholic hydroxyl groups (AC35 AC36 AC46 AC50 AC53 or AC54 takes precedence)

. Amino groups or imino groups

. Quaternary ammonium groups or quaternary iminium groups

. Functional groups having polymerisation initiator functions

. containing silicon atoms (AC23 AC59 AC60 AC67 or AC69 takes precedence)

. containing fluorine atoms

. containing phosphorus atoms

AD00
COMPOUND GENERATING RADICAL

AD01

AD02

AD03

AD04

AD05

AD06

AD07

AD09

AD10

. Norrish type I decompositions

. . Acetophenone compounds (AD06 takes precedence)

. . . Benzoin compounds or benzoin alkyl ether compounds

. . . Benzyl compounds

. . . Benzyl ketal compounds

. . Oxime ester compounds

. . Acylphosphine compounds

. Trihalomethyl compounds

. . Triazine compounds

AD11

AD12

AD13

AD14

AD15

AD16

AD18

AD19

AD20

. Types of hydrogen abstraction by carbonyls

. . Benzophenone compounds

. . . Bis(dimethylamino)benzophenones

. . . Bis(diethylamino)benzophenones

. . Xanthone compounds or thioxanthone compounds

. . Benzoquinone compounds or anthraquinone compounds

. Onium salts

. . Sulfonium compounds

. . Iodonium compounds

AD21

AD22

AD24

AD26

AD28

. Decompositions of sulfur-to-sulfur bonds

. . Disulfide compounds

. Biimidazoles

. Peracids or peroxides

. Borates

AD31

AD32

AD33

AD34

AD35

AD38

. Metal redox compounds

. . Metallocene compounds

. . . Ferrocene compounds

. . . Titanocene compounds

. . Silver halides

. Azos

AE00
COMPOUND HAVING A PLURALITY OF CROSSLINKABLE GROUPS, WHICH IS NOT COVERED BY ANY PLACE UNDER VIEWPOINT AA-AC

AE01

AE02

AE03

AE04

AE05

AE06

AE07

AE08

AE09

AE10

. Low-molecular-weight compounds having a plurality of crosslinkable groups

. . Methylol groups or alkoxymethyl groups

. . . Melamine compounds

. . . Urea compounds

. . . Phenol compounds

. . Epoxy groups or glycidyl groups

. . Oxetanyl groups

. . Isocyanate groups or blocked isocyanate groups

. . Silicon hydride (SiH) groups

. . Vinyl ether groups or vinyl ester groups

AE11

AE12

AE13

AE14

AE15

AE17

AE18

AE19

AE20

. Macromolecules having a plurality of crosslinkable groups

. . Epoxy groups or glycidyl groups

. . . Polyacrylates or polymethacrylates

. . . Novolak type epoxy resins

. . . Bisphenol type epoxy resins

. . Oxetanyl groups

. . . Polyacrylates or polymethacrylates

. . . Novolak types

. . . Bisphenol types

AE22

AE23

AE24

AE26

AE27

AE29

AE30

. . Methylol groups or alkoxymethyl groups

. . Vinyl ether groups or vinyl ester groups

. . Isocyanate groups or blocked isocyanate groups

. . Halogenated methyl groups

. . Halogenated phenyl groups

. . having silicon hydride (SiH) groups

. . . Polysiloxanes or ladder polysiloxanes

AE32

AE33

AE34

AE35

AE36

AE40

. . Dimerisation types

. . . Cinnamoyl compounds or cinnamic acids

. . . Benzalacetophenones or chalcones

. . . Stilbenes

. . . Styrylpyridiniums or stilbazoliums

. having unspecific constitutions

AF00
COMPOUND FORMING OR RELEASING ACID

AF01

AF02

AF03

AF04

AF05

AF07

AF08

AF09

. Compounds having o-quinonediazide groups

. . Low-molecular-weight compounds having naphthoquinonediazide (NQD) groups

. . . having two aromatic rings other than NQD groups

. . . having three aromatic rings other than NQD groups

. . . having four or more aromatic rings other than NQD groups

. . Macromolecules having NQD groups

. . . Novolak resins

. . . Pyrogallol acetone resins

AF11

AF12

AF13

AF14

AF15

AF16

AF17

AF18

AF19

AF20

. Onium salts (AA01 AA02 or AF61 takes precedence)

. . Constitutions of cation parts (AA01 AA02 or AF61 takes precedence)

. . . Sulfonium compounds

. . . . Polyvalent sulfonium compounds

. . . . . Macromolecular sulfonium compounds

. . . . having aromatic rings

. . . . . Triphenylsulfoniums

. . . . . Triphenylsulfoniums having substituents (AF14 or AF15 takes precedence)

. . . . . having phenacyl constitutions

. . . . . having aromatic condensed ring constitutions

AF21

AF22

AF24

AF25

AF26

AF27

AF29

AF30

. . . . having tetrahydrothiophenium constitutions

. . . . having aliphatic ring constitutions

. . . Iodonium compounds

. . . . Macromolecular iodonium compounds

. . . . Diphenyliodoniums

. . . . Diphenyliodoniums having substituents (AF25 takes precedence)

. . . Ammonium compounds or iminium compounds

. . . . having tetraalkylammonium constitutions

AF32

AF33

AF34

AF35

AF36

AF37

AF38

AF39

. . Constitutions of anion parts

. . . Sulfonate anions (RSO3-)

. . . . R being macromolecules

. . . . R being trifluoromethyl groups (CF3)

. . . . R being fluoroalkyl groups (CnF2n+1) wherein n is 2 or more and 4 or less

. . . . R being fluoroalkyl groups (CnF2n+1) wherein n is 5 or more

. . . . R having ring constitutions

. . . . . having fluorine atoms in rings

AF41

AF42

AF43

AF45

AF46

AF48

AF49

AF50

. . . Carboxylate anions (RCOO-)

. . . . R being macromolecules

. . . . R having fluorine atoms

. . . Imidate compounds or methide compounds

. . . Coordination type anions

. . . Borate compounds

. . . . having triphenyl alkyl borate constitutions

. . . . having boron on rings

AF51

AF52

AF53

AF54

AF55

AF57

AF59

AF60

. Sulfone compounds or sulfonic acid compounds

. . Oxime sulfonate compounds

. . Sulfonyl oxyimide compounds

. . Disulfone compounds

. . Sulfonyl diazomethane compounds

. Triazine compounds or trihalomethyl compounds

. Aromatic nitro compounds

. . Macromolecules having aromatic nitro groups

AF61

AF63

AF69

AF70

. Diazonium salts (AA01 or AA02 takes precedence)

. Organo-metallic compounds

. having unspecific constitutions

. combining two or more kinds

AG00
COMPOUND FORMING OR RELEASING BASE

AH00
MACROMOLECULE HAVING ACID OR BASE DISSOCIATIVE GROUP IN THE SIDE CHAIN (1)

AH01

AH02

AH03

AH04

AH05

AH06

AH07

AH08

AH09

AH10

. Constitutions of dissociative groups

. . crosslinking *

. . opening rings by acids or bases *

. . Acetals or ketals

. . . Alkoxyalkyl including cyclic constitutions"

. . . . Ethoxyethyl

. . . . Tetrahydropyranyl

. . Esters or ethers with phenols (AH04-AH07 take precedence)

. . . Silylesters or silylethers

. . . . Trimethylsilyl

AH11

AH12

AH13

AH14

AH15

AH16

AH17

AH18

AH19

AH20

. . . Tertiary carbon existing on chains

. . . . Tertiary-butyl (t-butyl)

. . . . Tertiary-butoxycarbonyl (t-BOC)

. . . . having cyclic constitutions

. . . . . Adamantyl groups being cyclic constitutions

. . . Tertiary carbon forming cyclic constitutions

. . . . 2-Alkyl-2-adamantyl

. . . . 2-Alkyl-2-norbornyl

. . . . 1-Alkylcyclopentyls or 1-alkylcyclohexyl

. . . . having lactone rings in dissociative groups

AH21

AH22

AH23

AH24

AH25

AH27

AH29

. containing atoms other than carbon oxygen hydrogen and silicon

. . Nitrogen

. . Sulfur

. . Fluorine

. . . having hexafluorohydroxypropyl groups

. Polycondensates or polyaddition products having end modifications

. combining two or more kinds of macromolecules covered by viewpoint AJ or AK

AJ00
MACROMOLECULE HAVING ACID OR BASE DISSOCIATIVE GROUP IN THE SIDE CHAIN (2); ADDITION POLYMER

AJ01

AJ02

AJ03

AJ04

AJ05

AJ07

AJ08

AJ09

. Units having dissociative groups

. . Styrenic units

. . . Hydroxystyrene compounds

. . . . 4-Hydroxystyrenes

. . . . 4-Isopropenylphenols

. . . Styrene compounds having carboxy groups

. . . . 4-Vinylbenzoic acids

. . . . 4-Vinylphenoxyacetic acids

AJ12

AJ13

AJ14

AJ16

AJ18

. . Acrylic units or methacrylic units

. . . Acrylic acids

. . . Methacrylic acids

. . . Alpha-substituted acrylic acids other than those substituted by methyl groups

. . . Acrylates or methacrylates having dissociative groups on cycloaliphatic rings

AJ22

AJ23

AJ24

AJ25

AJ26

AJ27

AJ29

. . Units having double bonds on rings

. . . Bicyclo compounds

. . . . Norbornene carboxylic acid compounds

. . . . . Norbornene carboxylic acids

. . . Tricyclo compounds

. . . Tetracyclo compounds

. . . having monocyclic rings and rings containing hetero atoms

AJ32

AJ33

AJ35

AJ37

AJ38

. . Other units having carbon-to-carbon double bonds

. . . Maleic acids or monomaleates

. . . Vinyl esters or vinyl ethers

. . . having allyl (CH2=CH-CH2-) groups which may be fluorinated

. . . . intramolecularly cyclising

AJ41

AJ42

AJ43

AJ44

AJ45

AJ47

AJ48

AJ49

. Units without having dissociative groups

. . Styrenic units

. . . Styrene compounds without hydroxyl groups on aromatic rings

. . . . Styrenes

. . . . having alkoxy (-OR) groups on aromatic rings

. . . Hydroxystyrene compounds

. . . . 4-Hydroxystyrenes

. . . . 4-Isopropenylphenols

AJ52

AJ53

AJ54

AJ55

AJ56

AJ57

AJ58

AJ59

AJ60

. . Acrylic units or methacrylic units

. . . Acrylic acids

. . . Acrylates

. . . . having lactone rings

. . . . consisting only of carbon and hydrogen and having cycloaliphatic rings

. . . . . 1-Adamantyl

. . . . having other cycloaliphatic rings than those covered by AJ56 (AJ55 takes precedence)

. . . . . 3-Hydroxy-1-adamantyl

. . . . having aromatic rings consisting only of carbon in the side chain

AJ63

AJ64

AJ65

AJ66

AJ67

AJ68

AJ69

AJ70

. . . Methacrylic acids

. . . Methacrylates

. . . . having lactone rings

. . . . consisting only of carbon and hydrogen and having cycloaliphatic rings

. . . . . 1-Adamantyl

. . . . having other cycloaliphatic rings than those covered by AJ66 (AJ65 takes precedence)

. . . . . 3-Hydroxy-1-adamantyl

. . . . having aromatic rings consisting only of carbon in the side chain

AJ73

AJ74

AJ75

AJ76

AJ77

AJ78

AJ79

AJ80

. . . Alpha-substituted acrylic acids other than those substituted by methyl groups

. . . Alpha-substituted acrylates other than those substituted by methyl groups

. . . . having lactone rings

. . . . consisting only of carbon and hydrogen and having cycloaliphatic rings

. . . . . 1-Adamantyl

. . . . having other cycloaliphatic rings than those covered by AJ76 (AJ75 takes precedence)

. . . . . 3-Hydroxy-1-adamantyl

. . . . having aromatic rings consisting only of carbon in the side chain

AJ82

AJ83

AJ84

AJ85

AJ87

AJ88

AJ89

AJ90

. . Units having double bonds on rings

. . . Rings containing hetero atoms

. . . . Maleic anhydrides

. . . . Maleimide compounds

. . . Bicyclo compounds whose rings consist only of carbon

. . . . Norbornenes

. . . Tricyclo compounds whose rings consist only of carbon

. . . Tetracyclo compounds whose rings consist only of carbon

AJ92

AJ93

AJ95

AJ97

AJ98

. . Other units having carbon-to-carbon double bonds

. . . Ethylene which may be fluorinated

. . . Vinyl esters or vinyl ethers

. . . having allyl (CH2=CH-CH2-) groups which may be fluorinated

. . . . intramolecularly cyclising

AK00
MACROMOLECULE HAVING ACID OR BASE DISSOCIATIVE GROUP IN THE SIDE CHAIN (3)

AK01

AK02

AK03

AK04

AK05

AK06

AK07

AK08

AK09

. Polycondensates or polyaddition products

. . Macromolecules containing silicon in the main chain (AK16 takes precedence)

. . . derived from trifunctional silanes (RSiX3)

. . . . having aromatic rings

. . . . . R being 4-hydroxybenzyl or those substituted by dissociative groups

. . . . . R being phenyl

. . . . having cycloaliphatic rings (AK04 takes precedence)

. . . . . R being norbornene rings which may have substituents

. . . . . R being tetracycloalkyls which may have substituents

AK12

AK13

AK15

AK16

AK19

. . Novolak resins

. . . consisting only of m-cresols or p-cresols and formaldehydes

. . Polyamides or polyimides or their precursors

. . . containing siloxane chains in the main chain

. . having dissociative bonds in the main chain

AK21

AK22

AK23

AK24

AK25

AK26

AK27

AK28

AK29

AK30

. Metathesis polymers

. . All rings consisting only of carbon

. . . having dissociative groups (AK26 AK28 or AK30 takes precedence)

. . . derived from bicyclo compounds

. . . . Norbornenes

. . . . having dissociative groups

. . . derived from tricyclo compounds

. . . . having dissociative groups

. . . derived from tetracyclo compounds

. . . . having dissociative groups

AL00
COMPOUND DISSOCIATED BY ACID OR BASE, WHICH IS NOT COVERED BY ANY PLACE UNDER AH-AK

AL01

AL02

AL03

AL05

AL07

AL08

. Dissociative constitutions

. . Acetal constitutions or ketal constitutions

. . Ester constitutions or ether constitutions with phenols (AL02 takes precedence)

. Macromolecules having dissociative bonds only in the main chain

. Dendrimers

. . having cyclic cores

AL11

AL12

AL13

AL14

AL15

AL16

AL17

AL18

AL19

AL20

. Other compounds having dissociative groups than those covered by AL05-AL08

. . Phenol compounds

. . . Polyhydroxybenzophenone compounds

. . . obtained by condensation of aldehydes or ketones with phenols

. . . . consisting only of two or three aromatic rings which are linked linearly

. . . . consisting only of four aromatic rings which are linked linearly

. . . . Aromatic rings being linked in branched form (AL19 or AL20 takes precedence)

. . . . . having three or four aromatic rings (AL19 or AL20 takes precedence)

. . . . Three or more aromatic rings being linked annularly

. . . . . having four aromatic rings on rings

AL22

AL23

AL25

. . Cycloaliphatic ring containing compounds

. . . having steroid skeletons

. . Cage-type silsesquioxane compounds

AM00
MACROMOLECULE WHICH IS NOT COVERED BY ANY PLACE UNDER VIEWPOINT AA-AL.

AM01

AM02

AM03

AM04

AM08

AM09

AM10

. Natural macromolecules or modified natural macromolecules

. . Proteins or modified proteins

. . . Gelatines or modified gelatines

. . Celluloses or modified celluloses

. in the form of particles

. having unspecific constitutions

. simultaneously using two or more kinds

AM11

AM12

AM13

AM14

AM15

AM16

AM18

. Addition polymers

. . Styrene compound units

. . . Styrenes

. . . Alpha-Methylstyrenes

. . . Hydroxystyrene compounds

. . . . Poly(4-hydroxystyrenes) *

. . Maleic acids or their salts halides anhydrides or ester units

AM22

AM23

AM24

AM25

AM26

AM27

AM29

AM30

. . Acrylate units or methacrylate units

. . . Alkyl acrylates or alkyl methacrylates or cycloalkyl acrylates or cycloalkyl methacrylates

. . . . Polymethylmethacrylates (PMMA) *

. . . 2-Hydroxyethyl methacrylates (HEMA)

. . . Poly(oxyalkylene)acrylates or poly(oxyalkylene)methacrylates

. . . Fluoroalkyl acrylates or fluoroalkyl methacrylates

. . Alpha-substituted acrylate units or beta-substituted acrylate units (AM18 AM22-AM27 take precedence)

. . . Alpha-halomethyl acrylates or alpha-trihalomethyl acrylates

AM32

AM33

AM34

AM36

AM38

AM39

AM40

. . Acrylic acids or methacrylic acids or their salts halides or anhydride units

. . Alpha-substituted acrylic acids or beta-substituted acrylic acids or their salts halides or anhydride units (AM18 or AM32 takes precedence)

. . . Alpha-halomethyl acrylic acids or alpha-trihalomethyl acrylic acids

. . Alpha beta-unsaturated nitrile units (AM29 or AM33 takes precedence)

. . Alpha beta-unsaturated carboxylic acid amide units or alpha beta-unsaturated carboxylic acid imide units

. . . Maleimide compounds

. . . Polymethyl glutarimides (PMGI) *

AM42

AM43

AM45

AM46

AM48

AM49

. . Units having double bonds on rings (AM18 or AM39 takes precedence)

. . . Bicyclo compounds whose rings consist only of carbon

. . Olefin units

. . . Halogenated olefins

. . Polyene units

. . . Diene rubber *

AM52

AM53

AM54

AM57

AM58

AM60

. . Vinyl alcohol units or vinyl acetate units

. . . Polyvinyl alcohols (PVA) *

. . Vinyl ether units or vinyl ester units (AM52 takes precedence)

. . Compound units in which vinyl groups or allyl groups are bound to other atoms than carbon or oxygen

. . . Vinyl pyrrolidones

. . Sulfur dioxide units

AM61

AM62

AM64

AM66

AM67

AM68

AM70

. Polycondensates or polyaddition products

. . Polyesters

. . Polyurethanes

. . Polyethers (AM70 takes precedence)

. . . Poly(oxyethylenes) (AM26 takes precedence)

. . . Poly(oxypropylenes) (AM26 takes precedence)

. . Epoxy resins

AM72

AM73

AM74

AM75

AM76

AM77

AM79

AM80

. . Polyamides

. . . Precursors of polyimides

. . . . containing siloxane chains in the main chain

. . . Precursors of polybenzoxazoles

. . . . containing siloxane chains in the main chain

. . Polyimides or polybenzoxazoles

. . Phenolic resins

. . . Novolak resins

AM82

AM84

AM85

AM86

AM88

AM90

. . Polycarbonates

. . Macromolecules containing silicon in the main chain

. . . Ladder polysiloxanes or orthosilicate condensates

. . . Polysiloxanes (AM74 AM76 or AM85 takes precedence)

. . Dendrimers

. . having end modifications (AM88 takes precedence)

AM91

AM92

AM93

AM94

AM95

AM96

AM99

. Acidic groups

. . Carboxy groups (AM18 AM32-AM34 AM73 or AM74 takes precedence)

. . Phenolic hydroxyl groups (AM15 AM16 AM75 AM76 AM79 or AM80 takes precedence)

. Alcoholic hydroxyl groups (AM25 AM26 AM52 AM53 or AM70 takes precedence)

. Amino groups or imino groups

. Quaternary ammonium groups or quaternary iminium groups

. containing fluorine atoms (AM27 takes precedence)

AN00
ORGANIC COMPOUND WHICH IS NOT COVERED BY ANY PLACE UNDER VIEWPOINT AA-AM

AN01

AN02

AN03

AN04

AN05

AN07

AN08

AN10

. Organic acids or their salts halides or anhydrides

. . Carboxylic acids

. . . Alpha-Amino acids or their esters

. . . Acrylic acids * or methacrylic acids * or crotonic acids *

. . Sulfonic acids

. Esters or amides of inorganic acids (AN79 takes precedence)

. . Carbonates

. Hydrocarbon compounds

AN11

AN12

AN13

AN14

AN15

AN16

AN19

. Alcoholic hydroxyl groups (AN64 takes precedence)

. . Methanol *

. . Ethanol *

. . Polyol compounds (AN64 takes precedence)

. . . Ethylene glycols *

. . . Diethylene glycols * or triethylene glycols *

. Aldehyde groups

AN21

AN22

AN23

AN24

AN25

AN26

AN28

AN29

AN30

. Phenolic hydroxyl groups

. . Hydroquinones * or hydroquinone monoalkyl ethers *

. . Hindered phenols

. . having two or three aromatic rings

. . having four or five aromatic rings

. . having six or more aromatic rings

. Condensed bridged or spiro ring constitutions consisting only of carbon alone

. . Naphthalene constitutions or anthracene constitutions

. . Bridged cycloaliphatic ring constitutions

AN31

AN32

AN33

AN34

AN35

AN36

AN37

AN38

AN39

. Ethers acetals or ketals

. . Cyclic ethers

. . . Epoxy groups

. . Ethers of polyol compounds

. . . Ethers of ethylene glycols

. . . Ethers of diethylene glycols * or ethers of triethylene glycols *

. . . Ethers of propylene glycols

. . . . Propylene glycol monomethyl ethers *

. . . . Propylene glycol monomethyl ether acetates *

AN41

AN42

AN43

AN44

AN45

AN46

AN47

AN49

AN50

. Ketones including quinone constitutions

. . Cycloheptanones * or cyclohexanones *

. . Benzophenone compounds

. . Carbonyl groups bound to acyclic carbon

. . . 2-Heptanones *

. . . Methyl isobutyl ketones *

. . . Acetones * or methyl ethyl ketones *

. Halogen-containing compounds

. . Fluorine-containing compounds (BA32 takes precedence)

AN51

AN52

AN53

AN54

AN55

AN56

AN57

AN58

AN59

AN60

. Carboxylates (AN03 takes precedence)

. . Alkyl esters of phthalic acids * or dialkyl esters of phthalic acids *

. . Lactones

. . . Gamma-butyrolactones *

. . . Coumarin constitutions *

. . without rings (AN03 or AN60 takes precedence)

. . . Ethyl lactates *

. . . Alkyl alkoxypropionates *

. . . Alkyl esters of acetic acids *

. . Acrylates or methacrylates

AN61

AN62

AN63

AN64

AN65

AN66

AN67

AN68

AN69

AN70

. Other nitrogen-containing constitutions than nitrogen-containing heterocyclic rings (AN75 takes precedence)

. . Amine compounds without aromatic rings (AN03 takes precedence)

. . . Trialkylamines

. . . Ethanolamine compounds

. . Amine compounds having aromatic rings (AN03 takes precedence)

. . . Triphenylmethane constitutions *

. . Ammonium constitutions or iminium constitutions

. . Carboxylic acid amides

. . Isocyanate groups or blocked isocyanate groups

. . Hydrazine compounds

AN71

AN72

AN73

AN74

AN75

AN77

AN78

AN79

AN80

. Other sulfur-containing constitutions than sulfur-containing heterocyclic rings (AN05 takes precedence)

. . Mercapto groups

. . Sulfones or disulfones sulfoxides or sulfides

. . Sulfonates

. . Sulfonic acid amides

. Other compounds containing hetero atoms

. . Silicon-containing compounds (BA05 or BA33 takes precedence)

. . Phosphorus-containing compounds or phosphates

. . Organo-metallic compounds (AN94 takes precedence)

AN81

AN82

AN83

AN84

AN85

AN86

AN87

AN88

AN89

. Heterocyclic rings (AN32 AN33 or AN53-AN55 takes precedence)

. . Heterocyclic rings consisting only of carbon and nitrogen

. . . Lactam constitutions

. . . . N-Methylpyrrolidones *

. . . Pyridine rings

. . . Imidazole compounds

. . . Benzotriazole compounds

. . Heterocyclic rings consisting only of carbon nitrogen and oxygen

. . Heterocyclic rings containing sulfur selenium or tellurium

AN91

AN92

AN93

AN94

AN96

. Polymethine constitutions *

. . Cyanine constitutions or merocyanine constitutions *

. . Styryl constitutions *

. Phthalocyanine constitutions *

. Dendrimer constitutions *

AP00
INORGANIC COMPOUND WHICH IS NOT COVERED BY ANY PLACE UNDER VIEWPOINT AA-AM

AP01

AP02

AP03

AP05

AP06

AP08

AP09

AP10

. Water *

. Carbon compounds

. . Carbon blacks *

. Metals

. . Silver *

. Metal oxides metal hydroxides or metal salts

. . Calcium carbonates * or barium sulfates *

. . Titanium oxides *

AP11

AP13

AP15

AP17

AP19

. Silicas * or colloidal silicas *

. Glass *

. Natural minerals

. Inorganic acids or their salts

. Ammonium salts (AN01-AN05 take precedence)

BA00
FUNCTION AS ADDITIVE

BA01

BA02

BA04

BA05

BA06

BA07

BA08

BA09

BA10

. mixing two kinds of solvents

. mixing three or more kinds of solvents

. Plasticisers

. Silane coupling agents

. Agents for improving adhesive properties (BA05 takes precedence)

. Anti-sticking agents

. Stabilisers

. . Antioxidants or polymerisation inhibitors

. Ultra-violet absorbents or fog inhibitors

BA11

BA12

BA13

BA15

BA16

BA17

BA18

BA20

. Sensitisers

. . Infra-red absorbents or photothermal conversion agents

. Polymerisation accelerators or chain-transferring agents

. Colour materials

. . Pigments

. . Dye

. . discolouring or colouring

. Fillers

BA21

BA22

BA24

BA26

BA27

BA28

BA30

. Crosslinking agents acting before imagewise exposure

. Crosslinking agents acting after development

. Thermal acid generators

. Acid diffusion controlling agents or acid deactivation inhibitors

. Solubility suppressants (AL takes precedence)

. Solubility accelerators

. Conductivity imparting agents

BA31

BA32

BA33

BA34

BA35

BA37

BA38

. Surfactants or defoamers

. . fluorine-based

. . silicon-based

. . without containing fluorine and silicon

. Pigment dispersing agents or particle dispersing agents

. Antistatic agents

. Flame retardants

CA00
USE

CA01

CA02

CA03

CA04

CA05

CA06

CA07

CA08

CA09

. Printing plates

. . Relief printing plates or flexographic plates

. . Lithographic plates

. . . Lithographic plates for laser scanning exposure

. . Lithographic plates without needing damping water

. . Intaglio plates or gravure plates

. . Screen plates or stencil plates

. Photomasks

. Colour proofing

CA11

CA12

CA13

CA15

CA16

CA17

CA18

CA19

. Electrical or electronic components

. . Semiconductor integrated circuits

. . Printed circuit boards

. Optical parts

. . Colour filters

. . . RGB constitutions

. . . Black matrix constitutions

. . Microlenses

CA21

CA22

CA23

CA24

CA26

CA28

CA30

. Display devices

. . Liquid crystal display devices

. . Plasma display devices

. . Organic electroluminescence (EL) devices

. Magnetic recording apparatus

. Optical information recording media

. Other special uses

CB00
KIND OF EXPOSURE ENERGY

CB01

CB02

CB03

CB04

CB05

CB06

CB07

CB08

CB09

CB10

. Infra-red rays near infra-red rays or infra-red lasers

. Visible light near ultra-violet light or ultra-violet light

. . Lasers thereof

. . . blue or purple

. . Mercury vapour lamps

. . . i-lines (365nm)

. Far ultra-violet light or vacuum ultra-violet light

. . Krypton fluoride (KrF) excimers (248nm)

. . Argon fluoride (ArF) excimers (193nm)

. . Molecular fluorine (F2) excimers (157nm)

CB11

CB12

CB13

CB15

CB16

CB18

CB19

. Extreme ultra-violet light soft X-rays or X-rays

. . Extreme ultra-violet (EUV) light

. . X-rays

. Charged particle rays

. . Electron rays

. Exposures exceeding diffraction limits of light

. . Near field light

CC00
IMAGE FORMING MODE

CC01

CC03

CC05

CC06

CC07

CC08

CC09

. Negative types

. Positive types

. Changing other properties than solubility

. . changing adhesive properties or sticking properties

. . changing hydrophilicity or lipophilicity

. . changing chemical reactivity

. . changing transmission or refractive indexes

CC11

CC12

CC13

CC15

CC16

CC17

CC18

CC20

. Photocrosslinking (CC17 or CC18 takes precedence)

. Photopolymerisation

. . Radical polymerisation

. Chemical amplification for imagewise exposure parts being rendered hydrophilic

. . Low-molecular-weight resists

. Chemical amplification for imagewise exposure parts being rendered hydrophobic

. . Low-molecular-weight resists

. Photodepolymerisation

CC21

CC23

CC25

CC26

CC28

CC29

CC30

. by constitutionally changing o-quinonediazides

. by constitutionally changing functional groups in the side chain (CC15-CC18 or CC21 takes precedence)

. by ring closure of polyimide precursors

. by ring closure of polybenzoxazole precursors

. by reaction of LB films or monomolecular films

. Ablation

. by changing crystalline states restricted to organic compounds

CD00
PROPERTY DESCRIBED IN THE SCOPE OF CLAIMS

CD01

CD02

CD03

CD04

CD05

CD06

CD07

CD08

CD09

CD10

. Chemical properties

. . Solubility

. . . Water solubility

. . . Water dispersibility or emulsions

. . Acidity or basicity

. . . Acid values

. . Hydrophilicity or hydrophobicity or contact angles

. . Ranges of molecular weights

. . Dispersity of molecular weights

. . Sensitivity

CD11

CD12

CD13

CD14

CD15

CD16

CD17

CD18

CD19

CD20

. Thermal or mechanical properties

. . Boiling points

. . Melting points or softening points

. . Glass transition temperatures (Tg)

. . Viscosity

. . Elasticity

. . Hardness

. . Surface roughness

. . Coefficients of friction

. . Film thickness

CD21

CD22

CD23

CD24

CD26

CD27

CD29

CD30

. Optical properties

. . Absorbance transmissivity or optical density

. . Absorption wavelengths or maximum absorption wavelengths

. . Haze values

. Electrical properties

. . High conductivity

. Particle diameters

. Particle size distributions

CD31

CD32

CD33

CD34

CD35

CD36

CD37

CD38

CD39

CD40

. for compositions their hardened materials or formed images

. for polyfunctional diazo photosensitive compounds or polyfunctional azide photosensitive compounds (covered by viewpoint AA)

. for inorganic photosensitive compounds (covered by viewpoint AB)

. for compounds containing radical polymerisable carbon-to-carbon unsaturated groups (covered by viewpoint AC)

. for compounds generating radicals (covered by viewpoint AD) or compounds forming acids or bases (covered by viewpoint AF or AG)

. for compounds having a plurality of crosslinkable groups (covered by viewpoint AE)

. for compounds dissociated by acids or bases (covered by viewpoint AH-AL)

. for macromolecules existing in image forming layers (covered by viewpoint AM)

. for macromolecules existing in other sections than image forming layers (covered by viewpoint AM)

. for other compounds or additives (covered by viewpoint AN AP or BA) or layer structures (covered by viewpoint DA)

DA00
LAYER STRUCTURE, RESTRICTED TO FEATURES OF THE INVENTION

DA01

DA02

DA03

DA04

DA05

DA06

DA07

DA08

DA09

DA10

. Non-imaging layers being upper layers of image forming layers excluding photosensitive transfer materials

. . Antireflection layers or antihalation layers

. . Liquid immersion protective layers

. . Antistatic layers

. . Photothermal conversion layers without forming latent images or visualised images

. . Oxygen-impervious layers

. . Anti-sticking layers

. . Layers for improving vacuum contact properties

. . Layers for improving water repellency or oil repellency

. . . Silicone rubber layers for lithographic plates without needing damping water

DA11

DA12

DA13

DA14

DA15

. characterised by constitutions of image forming layers excluding photosensitive transfer materials

. . having a plurality of image forming layers (FA12 takes precedence)

. . . having non-imaging layers between image forming layers (FA12 takes precedence)

. . . Contrast enhancement layers (CEL)

. . specifying distributions of constituents

DA21

DA22

DA23

DA24

DA25

DA26

DA27

DA28

DA30

. Non-imaging layers being lower layers of image forming layers excluding photosensitive transfer materials

. . Antireflection layers or antihalation layers

. . Flattening layers

. . Etching-resistant mask layers

. . . Spin-on-glass

. . Photothermal conversion layers without forming latent images or visualised images

. . Adhesive layers

. . Layers for improving hydrophilicity

. Specific relationships between layers

DA31

DA32

DA33

DA35

DA36

DA37

DA40

. Bases excluding photosensitive transfer materials

. . specifying surface shapes

. . specifying other materials than metals

. Rear surface layers excluding photosensitive transfer materials

. . Antistatic layers

. . Easy sliding layers

. Image receiving layers or transferred layers

DA41

DA42

DA43

DA44

DA45

DA46

DA47

DA48

DA49

DA50

. Layer structures of photosensitive transfer materials

. . characterised by temporary bases

. . characterised by protective films

. . characterised by constitutions of image forming layers

. . . having a plurality of image forming layers

. . characterised by non-imaging layers (DA42 or DA43 takes precedence)

. . . Cushion layers

. . . Adhesive layers

. . . Stripping layers or release layers

. . . Coloured layers without forming latent images or visualised images

EA00
PRELIMINARY TREATMENT OR LAYER FORMING METHOD, RESTRICTED TO FEATURES OF THE INVENTION

EA01

EA02

EA03

EA05

EA06

. Preparing compositions or methods for manufacturing thereof

. . Impurities

. Storing compositions

. Pre-treatments to coated materials

. . to bases

EA11

EA12

EA13

EA14

EA15

EA16

EA17

EA18

EA19

. Forming layers

. . Coating

. . . Spin coating

. . . Slit and spin coating

. . . Slit coating

. . Physical vapour deposition (PVD)

. . Chemical vapour deposition (CVD)

. . Langmuir-Blodgett (LB) methods

. . Lamination methods

EA21

EA22

EA23

EA24

EA26

. After-treatments of layer formation

. . Heating or drying

. . Full preliminary exposure

. . Removing surplus coating materials

. Washing the devices used for forming layers

FA00
METHOD FOR FORMING IMAGE

FA01

FA02

FA03

FA05

FA06

FA07

FA09

. Multiplex imagewise exposure

. . using multiple kinds of light sources

. Liquid immersion exposure

. Developers consisting of organic solvents alone

. Developers consisting of mixtures of water and organic solvents

. Developers consisting of acidic or neutral aqueous solutions (FA06 takes precedence)

. Development on machines

FA11

FA12

FA14

FA15

FA16

FA18

. Colouring or discolouring images according to development processes (FA12 takes precedence)

. Using microcapsules

. Dry development (FA11 or FA12 takes precedence)

. . Powder development or toner development

. . Stripping development

. Patterning performed a plurality of times

FA21

FA22

FA23

. Using the same compositions for both negative types and positive types

. . changed according to exposure methods

. . changed according to development methods

2H125	MATERIALS FOR PHOTOLITHOGRAPHY
	G03C3/00 ,301;G03F7/004-7/04;7/06,501;7/075-7/115;7/16-7/18