Descriptions for H10P and notes/indexes are displayed on this screen.


Note(s)
    This subclass covers processes or apparatus specially adapted for the manufacture or treatment of devices, or parts thereof, covered by class H10, which are generically applicable to these devices.[2026.01]Attention is drawn to the following:
      processes or apparatus specially adapted for the manufacture or treatment of devices, or parts thereof, which are covered by a single subclass of H10B-H10N, are classified in the subclass in question. For example, the manufacture of a transistor is classified in subclass H10D;processes or apparatus specially adapted for the manufacture or treatment of generic packages, interconnections, connectors or other constructional details of devices, which are covered by subclass H10W, are classified in the subclass in question. For example, the formation of a copper pillar bump connector is classified in subclass H10W.
    In this subclass, the periodic system used is the I to VIII group system indicated in the Periodic Table under Note (3) of section C.

Subclass indexes

BUILDING UP OF LAYERS, STRUCTURES OR MATERIALS

Bonding

10/00

Formation of materials

14/00

MODIFICATION OF LAYERS, STRUCTURES OR MATERIALS

Ion implantation

30/00

Diffusion of dopants

32/00

Irradiation with electromagnetic or particle radiation

34/00

Gettering

36/00

REMOVAL OF LAYERS, STRUCTURES OR MATERIALS

Etching

50/00

Grinding, lapping or polishing

52/00

Cutting or separating

54/00

Debonding

56/00

Singulating wafers or substrates into multiple chips, i.e. dicing

58/00

OTHER MANUFACTURE OR TREATMENT

Cleaning

70/00

Handling or holding of wafers, substrates or devices during manufacture or treatment thereof

72/00

Testing or measuring during manufacture or treatment of wafers, substrates or devices

74/00

Manufacture or treatment of masks on semiconductor bodies

76/00

Preparation of wafers

90/00

Other generic processes or apparatus for manufacture or treatments

95/00