G03F

PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrography, sensitive layers or processes G03G)

Note(s) In this subclass, the following terms or expressions are used with the meanings indicated:[5] "photosensitive" means not only sensitive of electromagnetic radiation but also to corpuscular radiation;"photosensitive compositions" covers photosensitive substances, e.g. quinonediazides, and, if applicable, binders or additives;"photosensitive materials" covers the photosensitive compositions, e.g. photoresists, the bases carrying them and, if applicable, auxiliary layers.