FI (list display)

  • C23C18/00
  • Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating [4] HB CC 4K022
  • C23C18/02
  • .by thermal decomposition [4] HB CC 4K022
  • C23C18/04
  • ..Pretreatment of the material to be coated (C23C 18/06 takes precedence) [4] HB CC 4K022
  • C23C18/06
  • ..Coating on selected surface areas, e.g. using masks [4] HB CC 4K022
  • C23C18/08
  • ..characterised by the deposition of metallic material [4] HB CC 4K022
  • C23C18/10
  • ...Deposition of aluminium only [4] HB CC 4K022
  • C23C18/12
  • ..characterised by the deposition of inorganic material other than metallic material [4] HB CC 4K022
  • C23C18/14
  • .Decomposition by irradiation, e.g. photolysis, particle radiation [4] HB CC 4K022
  • C23C18/16
  • .by reduction or substitution, i.e. electroless plating (C23C 18/54 takes precedence) [4] HB CC 4K022
  • C23C18/16@A
  • Characterized by plastic substrates HB CC 4K022
  • C23C18/16@B
  • Plating on semiconductor surfaces HB CC 4K022
  • C23C18/16@Z
  • Others HB CC 4K022
  • C23C18/18
  • ..Pretreatment of the material to be coated [4] HB CC 4K022
  • C23C18/20
  • ...of organic surfaces, e.g. resins [4] HB CC 4K022
  • C23C18/20@A
  • Irradiation of electromagnetic waves HB CC 4K022
  • C23C18/20@Z
  • Others HB CC 4K022
  • C23C18/22
  • ....Roughening, e.g. by etching [4] HB CC 4K022
  • C23C18/24
  • .....using acid aqueous solutions [4] HB CC 4K022
  • C23C18/26
  • .....using organic liquids [4] HB CC 4K022
  • C23C18/28
  • ....Sensitising or activating [4] HB CC 4K022
  • C23C18/30
  • .....Activating [4] HB CC 4K022
  • C23C18/31
  • ..Coating with metals [5] HB CC 4K022
  • C23C18/31@A
  • Coating on specific articles (excluding printed boards) HB CC 4K022
  • C23C18/31@E
  • Devices HB CC 4K022
  • C23C18/31@Z
  • Others HB CC 4K022
  • C23C18/32
  • ...Coating with one of iron, cobalt or nickel; Coating with mixtures of phosphorus or boron with one of these metals [4,5] HB CC 4K022
  • C23C18/34
  • ....using reducing agents [4,5] HB CC 4K022
  • C23C18/36
  • .....using hypophosphites [4,5] HB CC 4K022
  • C23C18/38
  • ...Coating with copper [4,5] HB CC 4K022
  • C23C18/40
  • ....using reducing agents [4,5] HB CC 4K022
  • C23C18/42
  • ...Coating with noble metals [4,5] HB CC 4K022
  • C23C18/44
  • ....using reducing agents [4,5] HB CC 4K022
  • C23C18/48
  • ..Coating with alloys [4,5] HB CC 4K022
  • C23C18/50
  • ...with alloys based on iron, cobalt or nickel (C23C 18/32 takes precedence) [4,5] HB CC 4K022
  • C23C18/52
  • ..using reducing agents for coating with metallic material not provided for in a single one of groups C23C 18/32-C23C 18/50 [4] HB CC 4K022
  • C23C18/52@A
  • Using grain diffusion composite plating liquid HB CC 4K022
  • C23C18/52@B
  • Laminated plating HB CC 4K022
  • C23C18/52@Z
  • Others HB CC 4K022
  • C23C18/54
  • .Contact plating, i.e. electroless electrochemical plating [4] HB CC 4K022
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