FI (list display)

  • C22C32/00
  • Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ [2] HB CC 4K016
  • C22C32/00@A
  • Ag radical HB CC 4K016
  • C22C32/00@B
  • Cu radical HB CC 4K016
  • C22C32/00@C
  • .With Sn as the next major constituent HB CC 4K016
  • C22C32/00@D
  • .With Zn as the next major constituent HB CC 4K016
  • C22C32/00@E
  • .With Ni as the next major constituent HB CC 4K016
  • C22C32/00@F
  • .With Al, Mn, Co or Pb as the next major constituent HB CC 4K016
  • C22C32/00@G
  • Pb radical, Sn radical or Zn radical HB CC 4K016
  • C22C32/00@H
  • Ti radical HB CC 4K016
  • C22C32/00@J
  • Zr radical HB CC 4K016
  • C22C32/00@K
  • V radical HB CC 4K016
  • C22C32/00@L
  • Nb radical HB CC 4K016
  • C22C32/00@M
  • Ta radical HB CC 4K016
  • C22C32/00@N
  • No radical HB CC 4K016
  • C22C32/00@P
  • Co radical HB CC 4K016
  • C22C32/00@Q
  • Al radical HB CC 4K016
  • C22C32/00@R
  • .With Si as the next major constituent HB CC 4K016
  • C22C32/00@S
  • .With Mg as the next major constituent HB CC 4K016
  • C22C32/00@T
  • .With Zn as the next major constituent HB CC 4K016
  • C22C32/00@U
  • .With Cu as the next major constituent HB CC 4K016
  • C22C32/00@V
  • Mg radical HB CC 4K016
  • C22C32/00@W
  • W radical HB CC 4K016
  • C22C32/00@X
  • Mo radical HB CC 4K016
  • C22C32/00@Y
  • Cr radical HB CC 4K016
  • C22C32/00@Z
  • Others HB CC 4K016
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